SCHEMBL5935948

SCHEMBL5935948

C=C(CCC12CC3(C)CC(C)(C1)CC(C(=O)O)(C3)C2)C(=O)O

nearest known ligand 0.37

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
PKM P14618 1/20 0.36
RAB9A P51151 1/20 0.33
TSHR P16473 1/20 0.32
HSD17B10 Q99714 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5935960 0.97 PKM (0.32) PKM
SCHEMBL5935934 0.91
SCHEMBL5935959 0.90
SCHEMBL5935973 0.87 TSHR (0.33) TSHRHSD17B10SMN1; SMN2
SCHEMBL5935926 0.85
SCHEMBL4089961 0.85 TSHR (0.38) PKMRAB9ATSHRHSD17B10SMN1; SMN2
SCHEMBL4093691 0.82
SCHEMBL2412044 0.82 DPP4 (0.31)
SCHEMBL4103897 0.82 TSHR (0.35) TSHRHSD17B10SMN1; SMN2
SCHEMBL4092701 0.80

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9348226-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2016-05-24 US disclosed
US-20060234154-A1 Mixture containing acid generator and free radical catalyst; acrylated ester monomer JSR CORPORATION (JP) 2006-10-19 US disclosed