SCHEMBL595455

SCHEMBL595455

[CH2]CCOCCc1ccccc1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA1 P00915 1/20 0.44
CA2 P00918 1/20 0.44
CA9 Q16790 1/20 0.44
IDO1 P14902 1/20 0.43
NPC1 O15118 1/20 0.42
RAB9A P51151 1/20 0.42
TSHR P16473 1/20 0.42
ALDH1A1 P00352 1/20 0.42
HPGD P15428 1/20 0.42
ALOX15 P16050 1/20 0.42
ALOX12 P18054 1/20 0.42
CASP1 P29466 1/20 0.42
HSD17B10 Q99714 1/20 0.42
TDP1 Q9NUW8 3/20 0.41
CYP2A6 P11509 1/20 0.41
HTR2A P28223 1/20 0.41
SMN1; SMN2 Q16637 1/20 0.41
TAAR1 Q96RJ0 1/20 0.41
LOXL2 Q9Y4K0 1/20 0.41
MEN1 O00255 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL198134 0.88 TSHR (0.52) CA1CA2CA9IDO1NPC1
SCHEMBL57901 0.87 IDO1 (0.55) IDO1TDP1HTR2AMEN1KMT2A
SCHEMBL4918943 0.87 MEN1 (0.46) CA1CA2CA9IDO1NPC1
SCHEMBL4918652 0.85 TDP1 (0.50) IDO1TDP1MEN1KMT2AHRH3
SCHEMBL2165874 0.85 MEN1 (0.45) CA1CA2CA9IDO1NPC1
SCHEMBL21496279 0.84 CA1 (0.42) CA1CA2CA9IDO1NPC1
SCHEMBL294494 0.84 CA1 (0.45) CA1CA2CA9IDO1NPC1
SCHEMBL9021144 0.84 TDP1 (0.53) IDO1TDP1MEN1KMT2AHRH3
SCHEMBL1580318 0.84 TDP1 (0.45) CA1CA2CA9IDO1NPC1
SCHEMBL9021246 0.84 TDP1 (0.53) IDO1TDP1MEN1KMT2AHRH3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 119 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116034127-B Silicon-containing monomer mixture, polysiloxane, resin composition, photosensitive resin composition, cured film, method for producing cured film, pattern cured film, and method for producing pattern cured film 中央硝子株式会社 2024-03-01 CN disclosed
US-20230408922-A1 APPLICATION LIQUID FOR OPTICAL MEMBER, POLYMER, PHOTOSENSITIVE APPLICATION LIQUID, METHOD FOR PRODUCING CURED FILM, METHOD FOR PRODUCING PATTERNED CURED FILM, AND METHOD FOR PRODUCING POLYMER CENTRAL GLASS COMPANY, LIMITED (JP) 2023-12-21 US disclosed
US-20230333468-A1 RESIN COMPOSITION, CURED FILM, METHOD FOR MANUFACTURING CURED FILM, SUBSTRATE HAVING MULTILAYER FILM, METHOD FOR PRODUCING PATTERNED SUBSTRATE, PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERN CURED FILM, METHOD FOR PRODUCING POLYMER, AND METHOD FOR PRODUCING RESIN COMPOSITION CENTRAL GLASS COMPANY, LIMITED (JP) 2023-10-19 US disclosed
US-20230322818-A1 SILICON COMPOUND, REACTIVE MATERIAL, RESIN COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, METHOD OF MANUFACTURING CURED FILM, PATTERNED CURED FILM, AND METHOD OF MANUFACTURING PATTERNED CURED FILM CENTRAL GLASS COMPANY, LIMITED (JP) 2023-10-12 US disclosed
CN-116601210-A Resin composition, cured film, method for producing cured film, substrate with multilayer film, method for producing substrate with pattern, photosensitive resin composition, method for producing pattern cured film, method for producing polymer, and method for producing resin composition 中央硝子株式会社 2023-08-15 CN disclosed
CN-116601244-A Coating liquid for optical member, polymer, cured film, photosensitive coating liquid, pattern cured film, optical member, solid-state imaging element, display device, silicone compound, stabilizer used in coating liquid, method for producing cured film, method for producing pattern cured film, and method for producing polymer 中央硝子株式会社 2023-08-15 CN disclosed
US-20230244145-A1 SILICON-CONTAINING MONOMER MIXTURE, POLYSILOXANE, RESIN COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, PRODUCTION METHOD FOR CURED FILM, PATTERNED CURED FILM, AND PRODUCTION METHOD FOR PATTERNED CURED FILM CENTRAL GLASS COMPANY, LIMITED (JP) 2023-08-03 US disclosed
CN-116034127-A Silicon-containing monomer mixture, polysiloxane, resin composition, photosensitive resin composition, cured film, method for producing cured film, pattern cured film, and method for producing pattern cured film 中央硝子株式会社 2023-04-28 CN disclosed
CN-114585630-A Silicon compound, reactive material, resin composition, photosensitive resin composition, cured film, method for producing cured film, patterned cured film, and method for producing patterned cured film 中央硝子株式会社 2022-06-03 CN disclosed
US-20210395461-A1 RESIN COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, METHOD FOR MANUFACTURING CURED FILM, PATTERNED CURED FILM, METHOD FOR PRODUCING PATTERNED CURED FILM CENTRAL GLASS COMPANY, LIMITED (JP) 2021-12-23 US disclosed
EP-0776893-A1 Azaheterocyclic compounds having tachykinin receptor antagonist activity; Nk1 and NK2 SANKYO COMPANY LIMITED (JP) 1997-06-04 EP disclosed
US-5635508-A FUNGICIDES NOVARTIS AG (CH) 1997-06-03 US disclosed
EP-0500853-B1 PHENYLETHANOLAMINES, DRUGS CONTAINING THESE COMPOUNDS, AND A METHOD OF PREPARING THEM THOMAE GMBH DR K (DE) 1996-12-27 EP disclosed
US-5453427-A Control phytopathogenic fungi especially in monocotelydons, podery mildew and rust SANDOZ LTD. (CH) 1995-09-26 US disclosed
US-5393774-A Antispasmodic agents PIEPER HELMUT (DE) 1995-02-28 US disclosed
EP-0634405-A1 Pyrimidinyl acrylic acid derivatives, process for their preparation and their use for the control of phytopathogens SANDOZ LTD. (CH) 1995-01-18 EP disclosed
EP-0428930-B1 Thiazolazo dye-stuffs BASF AG (DE) 1994-09-07 EP disclosed
EP-0500853-A1 PHENYLETHANOLAMINES, DRUGS CONTAINING THESE COMPOUNDS, AND A METHOD OF PREPARING THEM. THOMAE GMBH DR K (DE) 1992-09-02 EP disclosed
WO-1992004316-A1 PHENYLETHANOLAMINES, DRUGS CONTAINING THESE COMPOUNDS, AND A METHOD OF PREPARING THEM DR. KARL THOMAE GMBH (DE) 1992-03-19 WO disclosed
EP-0428930-A1 Thiazolazo dye-stuffs BASF Aktiengesellschaft (DE) 1991-05-29 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20230322818-A1 SILICON COMPOUND, REACTIVE MATERIAL, RESIN COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, METHOD OF MANUFACTURING CURED FILM, PATTERNED CURED FILM, AND METHOD OF MANUFACTURING PATTERNED CURED FILM RAD51, RER1, RPS4Y1 CA1 824/4885CA2 2572/4885CA9 374/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.