Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2C19 | P33261 | 3/20 | 0.38 |
| ▸ | TSHR | P16473 | 3/20 | 0.36 |
| ▸ | LMNA | P02545 | 2/20 | 0.35 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.35 |
| ▸ | USP2 | O75604 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.35 |
| ▸ | BLM | P54132 | 1/20 | 0.35 |
| ▸ | CACNA2D1 | P54289 | 1/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.35 |
| ▸ | GRM4 | Q14833 | 4/20 | 0.34 |
| ▸ | GRM2 | Q14416 | 3/20 | 0.34 |
| ▸ | GRM3 | Q14832 | 3/20 | 0.34 |
| ▸ | GRM8 | O00222 | 2/20 | 0.34 |
| ▸ | GRM6 | O15303 | 2/20 | 0.34 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.34 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.34 |
| ▸ | GRM5 | P41594 | 1/20 | 0.34 |
| ▸ | MTOR | P42345 | 1/20 | 0.34 |
| ▸ | GRM1 | Q13255 | 1/20 | 0.34 |
| ▸ | PLCB1 | Q9NQ66 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7018595 | 0.81 | CYP2C19 (0.46) | CYP2C19TSHRLMNACYP1A2USP2 | |
| SCHEMBL10276856 | 0.81 | CYP2C19 (0.46) | CYP2C19TSHRLMNACYP1A2USP2 | |
| SCHEMBL358029 | 0.81 | CYP2C19 (0.46) | CYP2C19TSHRLMNACYP1A2USP2 | |
| SCHEMBL3831087 | 0.81 | CYP2C19 (0.46) | CYP2C19TSHRLMNACYP1A2USP2 | |
| SCHEMBL23245204 | 0.78 | CYP2C19 (0.42) | CYP2C19TSHRLMNACYP1A2USP2 | |
| SCHEMBL11208917 | 0.78 | CYP2C19 (0.42) | CYP2C19TSHRLMNACYP1A2USP2 | |
| SCHEMBL9372565 | 0.75 | CYP2C19 (0.40) | CYP2C19TSHRLMNACYP1A2USP2 | |
| SCHEMBL8396115 | 0.75 | CYP2C19 (0.40) | CYP2C19TSHRLMNACYP1A2USP2 | |
| SCHEMBL7737327 | 0.75 | SLC1A2 (0.34) | CYP2C19TSHRALDH1A1SMN1; SMN2 | |
| SCHEMBL6701847 | 0.73 | GRM2 (0.32) | CYP2C19TSHRLMNACYP1A2GRM4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8129092-B2 | Resist pattern thickening material and process for forming resist pattern, and semiconductor device and method for manufacturing the same | FUJITSU LIMITED (JP) | 2012-03-06 | — | — | US | claimed |
| US-20120126372-A1 | RESIST PATTERN THICKENING MATERIAL AND PROCESS FOR FORMING RESIST PATTERN, AND SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME | FUJITSU LIMITED (JP) | 2012-05-24 | — | — | US | disclosed |
| US-8129092-B2 | Resist pattern thickening material and process for forming resist pattern, and semiconductor device and method for manufacturing the same | FUJITSU LIMITED (JP) | 2012-03-06 | — | — | US | disclosed |
| CN-1975571-B | Resist pattern thickening material and process for forming resist pattern, and semiconductor device and method for manufacturing the same | FUJITSU LTD | 2011-04-06 | — | — | CN | disclosed |
| EP-1793274-A2 | Resist pattern thickening material and process for forming resist pattern, and semiconductor device and method for manufacturing the same | FUJITSU LIMITED (JP) | 2007-06-06 | — | — | EP | disclosed |
| CN-1975571-A | Resist pattern thickening material and process for forming resist pattern, and semiconductor device and method for manufacturing the same | FUJITSU LTD (JP) | 2007-06-06 | — | — | CN | disclosed |
| US-20070123623-A1 | Resist pattern thickening material and process for forming resist pattern, and semiconductor device and method for manufacturing the same | FUJITSU LIMITED (JP) | 2007-05-31 | — | — | US | disclosed |