SCHEMBL5960754

SCHEMBL5960754

CCCCCCCCCCCC[Si](C)(C)OS(=O)(=O)C(F)(F)F

nearest known ligand 0.41

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
EPHX1 P07099 2/20 0.41
FAAH O00519 5/20 0.35
CES1 P23141 5/20 0.34
CES2 O00748 3/20 0.34
CA1 P00915 5/20 0.32
CA2 P00918 5/20 0.32
CA9 Q16790 5/20 0.32
CA12 O43570 1/20 0.32
CA3 P07451 1/20 0.32
CA4 P22748 1/20 0.32
CA6 P23280 1/20 0.32
CA5A P35218 1/20 0.32
CA7 P43166 1/20 0.32
CA14 Q9ULX7 1/20 0.32
CA5B Q9Y2D0 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5960755 1.00 EPHX1 (0.41) EPHX1FAAHCES1CES2CA1
SCHEMBL426531 1.00 EPHX1 (0.41) EPHX1FAAHCES1CES2CA1
SCHEMBL5960741 1.00 EPHX1 (0.41) EPHX1FAAHCES1CES2CA1
SCHEMBL5960735 1.00 EPHX1 (0.41) EPHX1FAAHCES1CES2CA1
SCHEMBL5960782 1.00 EPHX1 (0.41) EPHX1FAAHCES1CES2CA1
SCHEMBL424481 1.00 EPHX1 (0.41) EPHX1FAAHCES1CES2CA1
SCHEMBL5960814 1.00 EPHX1 (0.41) EPHX1FAAHCES1CES2CA1
SCHEMBL423499 1.00 EPHX1 (0.41) EPHX1FAAHCES1CES2CA1
SCHEMBL5960812 1.00 EPHX1 (0.41) EPHX1FAAHCES1CES2CA1
SCHEMBL425715 0.93 EPHX1 (0.35) EPHX1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8828144-B2 Process for cleaning wafers Central Grass Company, Limited (JP) 2014-09-09 US claimed
US-20120211025-A1 PROCESS FOR CLEANING WAFERS CENTRAL GLASS COMPANY, LIMITED (JP) 2012-08-23 US claimed
US-20140311379-A1 Method for Preparing Liquid Chemical for Forming Water Repellent Protective Film CENTRAL GLASS COMPANY, LIMITED (JP) 2014-10-23 US disclosed
US-8828144-B2 Process for cleaning wafers Central Grass Company, Limited (JP) 2014-09-09 US disclosed
US-20120211025-A1 PROCESS FOR CLEANING WAFERS CENTRAL GLASS COMPANY, LIMITED (JP) 2012-08-23 US disclosed
EP-1688423-A1 Silylation of hydroxyl group-containing compounds Shin-Etsu Chemical Co., Ltd. (JP) 2006-08-09 EP disclosed
EP-1334975-B1 Silylation of hydroxyl group-containing compounds SHINETSU CHEMICAL CO (JP) 2006-07-12 EP disclosed
US-6875880-B2 Silylation of hydroxyl groups SHIN-ETSU CHEMICAL, CO., LTD. (JP) 2005-04-05 US disclosed
EP-1334975-A1 Silylation of hydroxyl group-containing compounds SHIN-ETSU CHEMICAL CO., LTD. (JP) 2003-08-13 EP disclosed
US-20030139619-A1 Silylation of hydroxyl groups SHIN-ETSU CHEMICAL CO., LTD. (JP) 2003-07-24 US disclosed