SCHEMBL424481

SCHEMBL424481

CCCCCCCCCC[Si](C)(C)OS(=O)(=O)C(F)(F)F

nearest known ligand 0.41

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
EPHX1 P07099 2/20 0.41
FAAH O00519 5/20 0.35
CES1 P23141 5/20 0.34
CES2 O00748 3/20 0.34
CA1 P00915 5/20 0.32
CA2 P00918 5/20 0.32
CA9 Q16790 5/20 0.32
CA12 O43570 1/20 0.32
CA3 P07451 1/20 0.32
CA4 P22748 1/20 0.32
CA6 P23280 1/20 0.32
CA5A P35218 1/20 0.32
CA7 P43166 1/20 0.32
CA14 Q9ULX7 1/20 0.32
CA5B Q9Y2D0 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5960755 1.00 EPHX1 (0.41) EPHX1FAAHCES1CES2CA1
SCHEMBL426531 1.00 EPHX1 (0.41) EPHX1FAAHCES1CES2CA1
SCHEMBL5960741 1.00 EPHX1 (0.41) EPHX1FAAHCES1CES2CA1
SCHEMBL5960735 1.00 EPHX1 (0.41) EPHX1FAAHCES1CES2CA1
SCHEMBL5960782 1.00 EPHX1 (0.41) EPHX1FAAHCES1CES2CA1
SCHEMBL5960754 1.00 EPHX1 (0.41) EPHX1FAAHCES1CES2CA1
SCHEMBL5960814 1.00 EPHX1 (0.41) EPHX1FAAHCES1CES2CA1
SCHEMBL423499 1.00 EPHX1 (0.41) EPHX1FAAHCES1CES2CA1
SCHEMBL5960812 1.00 EPHX1 (0.41) EPHX1FAAHCES1CES2CA1
SCHEMBL425715 0.93 EPHX1 (0.35) EPHX1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 54 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113169060-B Chamfering part treating agent composition and method for manufacturing wafer 中央硝子株式会社 2025-04-01 CN claimed
US-20250066621-A1 COMPOSITION FOR FILM FORMATION AND METHOD FOR MANUFACTURING SUBSTRATE CENTRAL GLASS COMPANY, LIMITED (JP) 2025-02-27 US claimed
EP-4459666-A1 COMPOSITION FOR FILM FORMATION AND METHOD FOR PRODUCING SUBSTRATE Central Glass Company, Limited (JP) 2024-11-06 EP claimed
CN-118451534-A Film-forming composition and method for producing substrate 中央硝子株式会社 2024-08-06 CN claimed
WO-2024143097-A1 SUBSTRATE TREATING METHOD AND SUBSTRATE MANUFACTURING METHOD セントラル硝子株式会社 2024-07-04 WO claimed
CN-115699259-A Surface treatment method for semiconductor substrate and surface treatment agent composition 中央硝子株式会社 2023-02-03 CN claimed
CN-115668459-A Surface treatment method for semiconductor substrate and surface treatment agent composition 中央硝子株式会社 2023-01-31 CN claimed
CN-113169060-A Chamfer treatment agent composition and method for producing wafer 中央硝子株式会社 2021-07-23 CN claimed
US-9748092-B2 Liquid chemical for forming protecting film CENTRAL GLASS COMPANY, LIMITED (JP) 2017-08-29 US claimed
US-20160148802-A1 Liquid Chemical for Forming Protecting Film CENTRAL GLASS CO LTD (JP) 2016-05-26 US claimed
US-9228120-B2 Liquid chemical for forming protecting film CENTRAL GLASS COMPANY, LIMITED (JP) 2016-01-05 US claimed
US-8828144-B2 Process for cleaning wafers Central Grass Company, Limited (JP) 2014-09-09 US claimed
US-20120211025-A1 PROCESS FOR CLEANING WAFERS CENTRAL GLASS COMPANY, LIMITED (JP) 2012-08-23 US claimed
US-20120017934-A1 Liquid Chemical for Forming Protecting Film CENTRAL GLASS COMPANY, LIMITED (JP) 2012-01-26 US claimed
US-20260018421-A1 SUBSTRATE PROCESSING METHOD, AND SUBSTRATE MANUFACTURING METHOD CENTRAL GLASS CO LTD (JP) 2026-01-15 US disclosed
US-20250343040-A1 SUBSTRATE PROCESSING METHOD AND SUBSTRATE PRODUCTION METHOD CENTRAL GLASS CO LTD (JP) 2025-11-06 US disclosed
EP-4535406-A1 SUBSTRATE PROCESSING METHOD, AND SUBSTRATE MANUFACTURING METHOD Central Glass Company, Limited (JP) 2025-04-09 EP disclosed
US-6875880-B2 Silylation of hydroxyl groups SHIN-ETSU CHEMICAL, CO., LTD. (JP) 2005-04-05 US disclosed
EP-1334975-A1 Silylation of hydroxyl group-containing compounds SHIN-ETSU CHEMICAL CO., LTD. (JP) 2003-08-13 EP disclosed
US-20030139619-A1 Silylation of hydroxyl groups SHIN-ETSU CHEMICAL CO., LTD. (JP) 2003-07-24 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260018421-A1 SUBSTRATE PROCESSING METHOD, AND SUBSTRATE MANUFACTURING METHOD ESPL1, SMS, SGMS1 EPHX1 2321/4885FAAH 4385/4885CES1 1554/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.