SCHEMBL5960790

SCHEMBL5960790

O=S(=O)(O)C(F)(F)C(F)(F)F.[InH3]

nearest known ligand 0.41

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.41
L3MBTL1 Q9Y468 1/20 0.41
CA2 P00918 5/20 0.37
CA1 P00915 4/20 0.37
CA7 P43166 1/20 0.37
CA13 Q8N1Q1 1/20 0.37
TSHR P16473 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
MMP1 P03956 2/20 0.35
MMP2 P08253 2/20 0.35
MMP9 P14780 2/20 0.35
MMP8 P22894 2/20 0.35
MMP13 P45452 2/20 0.35
F2 P00734 3/20 0.32
PRSS1 P07477 3/20 0.32
PRSS2 P07478 3/20 0.32
PRSS3 P35030 3/20 0.32
CA5A P35218 1/20 0.31
CA5B Q9Y2D0 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL105340 0.97 ALDH1A1 (0.43) ALDH1A1L3MBTL1CA2CA1CA7
SCHEMBL733474 0.93 ALDH1A1 (0.41) ALDH1A1L3MBTL1CA2CA1CA7
SCHEMBL10629820 0.93 ALDH1A1 (0.41) ALDH1A1L3MBTL1CA2CA1CA7
SCHEMBL15765947 0.93 ALDH1A1 (0.41) ALDH1A1L3MBTL1CA2CA1CA7
Trifluoromethanesulfonic Acid SCHEMBL3266488 0.93 ALDH1A1 (0.41) ALDH1A1L3MBTL1CA2CA1CA7
Hydrochloric Acid SCHEMBL18725327 0.93 ALDH1A1 (0.41) ALDH1A1L3MBTL1CA2CA1CA7
SCHEMBL6915617 0.93 ALDH1A1 (0.41) ALDH1A1L3MBTL1CA2CA1CA7
Ammonia Solution, Strong SCHEMBL3049259 0.93 ALDH1A1 (0.41) ALDH1A1L3MBTL1CA2CA1CA7
SCHEMBL21549838 0.93 ALDH1A1 (0.41) ALDH1A1L3MBTL1CA2CA1CA7
SCHEMBL11316772 0.93 ALDH1A1 (0.41) ALDH1A1L3MBTL1CA2CA1CA7

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1688423-A1 Silylation of hydroxyl group-containing compounds Shin-Etsu Chemical Co., Ltd. (JP) 2006-08-09 EP disclosed
EP-1334975-B1 Silylation of hydroxyl group-containing compounds SHINETSU CHEMICAL CO (JP) 2006-07-12 EP disclosed
US-6875880-B2 Silylation of hydroxyl groups SHIN-ETSU CHEMICAL, CO., LTD. (JP) 2005-04-05 US disclosed
US-6830704-B2 Contains a Lewis acid metal salt and a compound having clathrating ability. TOAGOSEI CO., LTD. (JP) 2004-12-14 US disclosed
EP-1334975-A1 Silylation of hydroxyl group-containing compounds SHIN-ETSU CHEMICAL CO., LTD. (JP) 2003-08-13 EP disclosed
US-20030139619-A1 Silylation of hydroxyl groups SHIN-ETSU CHEMICAL CO., LTD. (JP) 2003-07-24 US disclosed
US-20030135016-A1 Contains a Lewis acid metal salt and a compound having clathrating ability. TOAGOSEI CO., LTD. 2003-07-17 US disclosed
US-6547985-B1 Adhesive mixture TOGOSEI CO., LTD. (JP) 2003-04-15 US disclosed