Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Tetramethylammonium Ion. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Tetramethylammonium Ion SCHEMBL104591 | 0.95 | CA1 (0.50) | — | |
| Tetramethylammonium Ion SCHEMBL28237525 | 0.91 | CA1 (0.46) | — | |
| Tetramethylammonium Ion SCHEMBL28607016 | 0.91 | CA1 (0.46) | — | |
| Oxalic Acid SCHEMBL3235689 | 0.87 | CA4 (0.54) | — | |
| Tetramethylammonium Ion SCHEMBL22076673 | 0.87 | CA1 (0.43) | — | |
| Tetramethylammonium Ion SCHEMBL9748322 | 0.84 | CA1 (0.40) | — | |
| Tetramethylammonium Ion SCHEMBL108420 | 0.82 | — | — | |
| Oxalic Acid SCHEMBL36805 | 0.82 | CA4 (0.58) | — | |
| Tetramethylammonium Ion SCHEMBL106975 | 0.82 | — | — | |
| Tetramethylammonium Ion SCHEMBL28109322 | 0.82 | CA1 (0.73) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 62 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20210140096-A1 | GRAPHENE MATERIAL COATING AND PREPARATION METHOD THEREOF, AIR FILTRATION DEVICE AND SYSTEM | HUBEI HIGHLAND GRAPHENE TECHNOLOGY CO., LTD. (CN) | 2021-05-13 | — | — | US | claimed |
| US-5693599-A | Flux washing agent | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1997-12-02 | — | — | US | claimed |
| US-5538832-A | Developing solution for producing printed circuit boards and a process for producing printed circuit boards wherein the developing solution comprises a quaternary ammonium hydroxide and a quaternary ammonium carbonate | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1996-07-23 | — | — | US | claimed |
| US-4634509-A | ELECTROLYSIS OF AQUEOUS QUATERNARY AMMONIUM CARBONATE | TAMA CHEMICAL CO., LTD. (JP) | 1987-01-06 | — | — | US | claimed |
| JP-3197450-A | — | — | None | — | — | JP | disclosed |
| EP-4039760-B1 | POLISHING COMPOSITION | FUJIMI INC (JP) | 2026-04-08 | — | — | EP | disclosed |
| EP-4717720-A1 | CATALYST COMPOSITION, BLOCKED POLYISOCYANATE COMPOSITION, COATING MATERIAL COMPOSITION, COATING FILM, AND METHOD FOR FORMING COATING FILM | Tosoh Corporation (JP) | 2026-04-01 | — | — | EP | disclosed |
| US-12359039-B2 | Metal oxide particle-containing composition with reduced occurrence of volatile aldehydes | NISSAN CHEMICAL CORPORATION (JP) | 2025-07-15 | — | — | US | disclosed |
| WO-2025057876-A1 | METAL OXIDE SOL CONTAINING POLYMERIZABLE SILANE COMPOUND AND METHOD FOR PRODUCING SAME | 日産化学株式会社 | 2025-03-20 | — | — | WO | disclosed |
| WO-2025037542-A1 | POLISHING COMPOSITION | 株式会社フジミインコーポレーテッド | 2025-02-20 | — | — | WO | disclosed |
| WO-2024262553-A1 | CATALYST COMPOSITION, BLOCKED POLYISOCYANATE COMPOSITION, COATING MATERIAL COMPOSITION, COATING FILM, AND METHOD FOR FORMING COATING FILM | 東ソー株式会社 | 2024-12-26 | — | — | WO | disclosed |
| US-20240417533-A1 | METAL OXIDE PARTICLE-CONTAINING COMPOSITION WITH REDUCED OCCURRENCE OF VOLATILE ALDEHYDES | NISSAN CHEMICAL CORPORATION (JP) | 2024-12-19 | — | — | US | disclosed |
| EP-1808512-A1 | ELECTROLYSIS ELECTRODE AND METHOD FOR PRODUCING AQUEOUS QUATERNARY AMMONIUM HYDROXIDE SOLUTION USING SUCH ELECTROLYSIS ELECTRODE | Tama Chemicals Co., Ltd. (JP) | 2007-07-18 | — | — | EP | disclosed |
| US-5693599-A | Flux washing agent | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1997-12-02 | — | — | US | disclosed |
| US-5557020-A | High-purity perfluoro-4-methyl-2-pentene and its preparation and use | HOECHST AKTIENGESELLSCHAFT (DE) | 1996-09-17 | — | — | US | disclosed |
| US-5538832-A | Developing solution for producing printed circuit boards and a process for producing printed circuit boards wherein the developing solution comprises a quaternary ammonium hydroxide and a quaternary ammonium carbonate | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1996-07-23 | — | — | US | disclosed |
| US-5516928-A | REACTION OF ISOPHORONE AND HYDROGEN CYANIDE USING QUATERNARY AMMONIUM CATALYST | BASF AKTIENGESELLSCHAFT (DE) | 1996-05-14 | — | — | US | disclosed |
| JP-H03197450-A | PRODUCTION OF DITETRAALKYLAMMONIUM CARBONATE | MITSUI PETROCHEM IND LTD | 1991-08-28 | — | — | JP | disclosed |
| US-4792613-A | Polyfluorinated cyclic carbonates | HOECHST AKTIENGESELLSCHAFT (DE) | 1988-12-20 | — | — | US | disclosed |
| EP-0269949-A2 | Process for producing a high purity quaternary ammonium hydroxide | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1988-06-08 | — | — | EP | disclosed |