SCHEMBL59849

SCHEMBL59849

CCOC([SiH3])OCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methane SCHEMBL25432464 0.96
SCHEMBL27521268 0.96
Trimethylammonium SCHEMBL28237498 0.90 THRB (0.42)
SCHEMBL28253945 0.90 THRB (0.42)
SCHEMBL29061880 0.83
SCHEMBL29088813 0.83 THRB (0.36)
SCHEMBL28443743 0.81 THRB (0.35)
SCHEMBL17800240 0.79 TSHR (0.43)
SCHEMBL8889491 0.74
SCHEMBL4837782 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 4895 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12610790-B2 Structure including a photoresist underlayer and method of forming same ASM IP HOLDING B.V. (NL) 2026-04-21 US claimed
US-12512313-B2 Method of forming low-k material layer with high-frequency power, structure including the layer, and system for forming same ASM IP HOLDING B.V. (NL) 2025-12-30 US claimed
US-20250374580-A1 LOW K INNER SPACER FORMATION BY SELECTIVE PECVD PROCESS IN GATE-ALL-AROUND (GAA) NANOSHEET DEVICE APPLIED MATERIALS INC (US) 2025-12-04 US claimed
US-20250357108-A1 LOW-K DIELECTRIC AND PROCESSES FOR FORMING SAME FORMING SAME TAIWAN SEMICONDUCTOR MFG CO LTD (TW) 2025-11-20 US claimed
US-20250343032-A1 SUBSTRATE PROCESSING APPARATUS WITH TEMPERATURE CONTROLLER ASM IP HOLDING BV (NL) 2025-11-06 US claimed
EP-4045966-B1 OPTICAL STRUCTURE AND METHOD OF MANUFACTURING IT UNIV CLAUDE BERNARD LYON (FR) 2025-06-18 EP claimed
US-12331164-B2 Curable siloxane resin composition KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) 2025-06-17 US claimed
CN-120157703-A Synthesis and purification method of electronic grade diethoxymethyl silane 贵州威顿晶磷电子材料股份有限公司 2025-06-17 CN claimed
CN-120058775-A Purification method of alkyl alkoxy silane 江苏南大光电材料股份有限公司 2025-05-30 CN claimed
CN-119965085-A Preparation method of porous material 青岛澳柯玛云联信息技术有限公司 2025-05-09 CN claimed
EP-0707009-A1 Process for the preparation of 3-acryloxypropyl alkoxysilanes HÜLS AKTIENGESELLSCHAFT (DE) 1996-04-17 EP claimed
WO-1996010574-A1 METHOD FOR PREPARING CONCENTRATED BIOLOGICALLY ACTIVE SILICON COMPOUNDS EXSYMOL (MC) 1996-04-11 WO claimed
US-5391691-A Melt condensing am aromatic diol compound and a carbonic acid diester in the presence of an interesterification catalyst and co-presence of an organosilicon compound MITSUBISHI PETROCHEMICAL CO., LTD. (JP) 1995-02-21 US claimed
EP-0594175-A1 Process for producing aromatic polycarbonate MITSUBISHI CHEMICAL CORPORATION (JP) 1994-04-27 EP claimed
US-5298572-A Reacting polyisocyanate, monol and organic polyacyl compounds, forming terminally unsaturated polymers, reacting with a dialkoxysilane and curing OLIN CORPORATION (US) 1994-03-29 US claimed
US-5227434-A Dialkoxylalkylsilyl-terminated polyester OLIN CORPORATION (US) 1993-07-13 US claimed
EP-0175540-B1 20-SILYL ETHER STEROIDS, AND PREPARING 17-HYDROXY-20-KETO STEROIDS THE UPJOHN COMPANY (US) 1989-05-31 EP claimed
EP-0175540-A2 20-Silyl ether steroids, and preparing 17-hydroxy-20-keto steroids THE UPJOHN COMPANY (US) 1986-03-26 EP claimed
US-4568492-A HYDROSILYLATION THEN PERACID OXIDATION THE UPJOHN COMPANY (US) 1986-02-04 US claimed
US-4410338-A FORMING POLYMER FILM ON SUBSTRATE BY PLASMA POLYMERIZATION KABUSHIKI KAISHA TOYOTA CHUO KENKYUSHO (JP) 1983-10-18 US claimed