SCHEMBL5987940

SCHEMBL5987940

CC1(OC(=O)CBr)CCCC1

nearest known ligand 0.47

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
▸ CYP19A1 P11511 1/20 0.47
▸ TRPA1 O75762 2/20 0.38
▸ ALDH1A1 P00352 1/20 0.38
▸ CYP2C19 P33261 1/20 0.33
▸ L3MBTL1 Q9Y468 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8386198 0.98 CYP19A1 (0.50) CYP19A1TRPA1ALDH1A1CYP2C19L3MBTL1
SCHEMBL31628707 0.83 CYP19A1 (0.45) CYP19A1ALDH1A1
SCHEMBL118423 0.80 CYP19A1 (0.49) CYP19A1ALDH1A1
SCHEMBL5702525 0.80 CYP19A1 (0.49) CYP19A1
SCHEMBL5702529 0.80 CYP19A1 (0.53) CYP19A1
SCHEMBL25397835 0.80 CYP19A1 (0.53) CYP19A1CYP2C19
SCHEMBL18266791 0.78 CYP19A1 (0.47) CYP19A1
SCHEMBL9626574 0.78 CYP19A1 (0.47) CYP19A1
SCHEMBL5702555 0.78 CYP19A1 (0.51) CYP19A1CYP2C19
SCHEMBL18558011 0.78 CYP19A1 (0.47) CYP19A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025126793-A1 METHOD FOR PRODUCING POLYCARBOXYLIC ACID ESTER COMPOUND 本州化学工業株式会社 2025-06-19 — — WO disclosed
WO-2025126794-A1 METHOD FOR PRODUCING POLYCARBOXYLIC ACID ESTER COMPOUND 本州化学工業株式会社 2025-06-19 — — WO disclosed
WO-2025094825-A1 HETEROPOLYOXOMETALATE HAVING MODIFIED LACUNARY SITE, OR MIXTURE THEREOF 東京応化工業株式会社 2025-05-08 — — WO disclosed
WO-2025094826-A1 HETEROPOLYOXOMETALATE HAVING MODIFIED LACUNARY SITE, OR MIXTURE THEREOF 東京応化工業株式会社 2025-05-08 — — WO disclosed
WO-2019187632-A1 ACTIVE-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTIVE-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMATION METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, AND POLYESTER 富士フイルム株式会社 2019-10-03 — — WO disclosed
US-7144902-B1 Prodrugs of thrombin inhibitors ABBOTT GMBH & CO. KG (DE) 2006-12-05 — — US disclosed
US-5374656-A Nervous system disorders, gastrointestinal disorders RHONE-POULENC RORER, S.A. (FR) 1994-12-20 — — US disclosed
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