⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trimethylammonium SCHEMBL1094030 | 0.92 | ALDH1A1 (0.36) | — | |
| SCHEMBL8607238 | 0.77 | — | — | |
| 1,1-Dichloroethene SCHEMBL10628226 | 0.77 | FFAR3 (0.40) | — | |
| SCHEMBL182647 | 0.73 | TDP1 (0.41) | — | |
| SCHEMBL16922257 | 0.73 | — | — | |
| Chloromethane SCHEMBL7131444 | 0.73 | — | — | |
| SCHEMBL7762648 | 0.73 | — | — | |
| SCHEMBL28105202 | 0.73 | TSHR (0.31) | — | |
| SCHEMBL107405 | 0.71 | — | — | |
| SCHEMBL7628529 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 627 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115621535-B | Composite solid electrolyte composition and preparation method and application thereof | 中国科学院过程工程研究所 | 2025-04-29 | — | — | CN | claimed |
| CN-119200332-A | Layered structure for electron beam lithography process and lithography process thereof | 国科天骥(山东)新材料有限责任公司 | 2024-12-27 | — | — | CN | claimed |
| CN-119179230-A | Electron beam photoresist composition containing self-crosslinking resin and preparation method and application thereof | 国科天骥(山东)新材料有限责任公司 | 2024-12-24 | — | — | CN | claimed |
| CN-116196485-B | Polymer-based biomedical stent and preparation method thereof | 中国科学院深圳先进技术研究院 | 2024-09-24 | — | — | CN | claimed |
| CN-118308048-A | Water-based binder with high-branched crosslinked network structure, preparation method thereof, negative plate and battery | 天目湖先进储能技术研究院有限公司 | 2024-07-09 | — | — | CN | claimed |
| CN-118271772-A | Microsphere toughened polymethacrylimide foam and preparation method thereof | 浙江中科恒泰新材料科技有限公司 | 2024-07-02 | — | — | CN | claimed |
| CN-118231666-A | Silicon negative electrode water-based adhesive with controllable viscosity, preparation method thereof, negative electrode plate and battery | 天目湖先进储能技术研究院有限公司 | 2024-06-21 | — | — | CN | claimed |
| CN-117980355-A | Water repellent organic particles with anti-skid effect | 大金工业株式会社 | 2024-05-03 | — | — | CN | claimed |
| CN-117645859-B | Formaldehyde-free environment-friendly wood veneer board and preparation process thereof | 汉斯(上海)智能家居科技股份有限公司 | 2024-04-30 | — | — | CN | claimed |
| CN-117886706-A | Monoamine monomer containing trifluoromethyl and alkynyl, application of monoamine monomer, photosensitive polyimide film and preparation method of photosensitive polyimide film | 安徽国风新材料股份有限公司 | 2024-04-16 | — | — | CN | claimed |
| WO-2019034597-A1 | FORCE-RESPONSIVE POLYMERSOMES AND NANOREACTORS; PROCESSES UTILIZING THE SAME | ADOLPHE MERKLE INSTITUTE, UNIVERSITY OF FRIBOURG (CH) | 2019-02-21 | — | — | WO | claimed |
| US-10092881-B2 | Permanent hydrophilic porous coatings and methods of making them | BHA ALTAIR, LLC (US) | 2018-10-09 | — | — | US | claimed |
| US-9512242-B2 | Polymerizable oligomer and photoresist composition comprising the same | BOE TECHNOLOGY GROUP CO., LTD. (CN) | 2016-12-06 | — | — | US | claimed |
| US-20160137758-A1 | POLYMERIZABLE OLIGOMER AND PHOTORESIST COMPOSITION COMPRISING THE SAME | BOE TECHNOLOGY GROUP CO., LTD. (CN) | 2016-05-19 | — | — | US | claimed |
| US-9323151-B2 | Photosensitive oligomer for photosensitive resist, method for preparing the same, and negative photosensitive resist resin composition | BOE TECHNOLOGY GROUP CO., LTD. (CN) | 2016-04-26 | — | — | US | claimed |
| US-20150153645-A1 | PHOTOSENSITIVE OLIGOMER FOR PHOTOSENSITIVE RESIST, METHOD FOR PREPARING THE SAME, AND NEGATIVE PHOTOSENSITIVE RESIST RESIN COMPOSITION | BOE TECHNOLOGY GROUP CO., LTD. (CN) | 2015-06-04 | — | — | US | claimed |
| US-20090191398-A1 | MEMBRANES COMPRISING HYDROPHILIC COATINGS | GENERAL ELECTRIC COMPANY (US) | 2009-07-30 | — | — | US | claimed |
| US-20090191399-A1 | PERMANENT HYDROPHILIC POROUS COATINGS ONTO A SUBSTRATE AND POROUS MEMBRANES THEREOF | GENERAL ELECTRIC COMPANY (US) | 2009-07-30 | — | — | US | claimed |
| US-4857566-A | Curable latex composition, films and foams formed therefrom and method for curing the composition | THE DOW CHEMICAL COMPANY (US) | 1989-08-15 | — | — | US | claimed |
| EP-0245021-A2 | Curable latex composition, films and foams formed therefrom and method for curing the composition | THE DOW CHEMICAL COMPANY (US) | 1987-11-11 | — | — | EP | claimed |