Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 1/20 | 0.35 |
| ▸ | CA1 | P00915 | 1/20 | 0.32 |
| ▸ | CA2 | P00918 | 1/20 | 0.32 |
| ▸ | CA4 | P22748 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL685945 | 0.78 | KMT2A (0.42) | KMT2ACA1CA2CA4 | |
| SCHEMBL12422471 | 0.75 | KMT2A (0.38) | KMT2ACA1CA2CA4 | |
| SCHEMBL686045 | 0.71 | KMT2A (0.45) | KMT2ACA1CA2CA4 | |
| SCHEMBL244365 | 0.68 | KMT2A (0.47) | KMT2ACA1CA2CA4 | |
| Trifluoromethanesulfonic Acid SCHEMBL4410247 | 0.67 | KMT2A (0.36) | KMT2ACA1CA2CA4 | |
| SCHEMBL686204 | 0.66 | CA1 (0.45) | KMT2ACA1CA2CA4 | |
| SCHEMBL8169160 | 0.66 | KMT2A (0.39) | KMT2ACA1CA2CA4 | |
| SCHEMBL5159900 | 0.65 | KMT2A (0.46) | KMT2ACA1CA2CA4 | |
| SCHEMBL7643135 | 0.65 | KMT2A (0.46) | KMT2ACA1CA2CA4 | |
| SCHEMBL5160383 | 0.65 | KMT2A (0.46) | KMT2ACA1CA2CA4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7033731-B2 | Multilayered body for photolithographic patterning | TOKYO OHKA KOGYO CO., LTD. (JP) | 2006-04-25 | — | — | US | disclosed |
| US-6864036-B2 | Negative-working photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2005-03-08 | — | — | US | disclosed |
| US-20050008972-A1 | Multilayered body for photolithographic patterning | TACHIKAWA TOSHIKAZU (JP) | 2005-01-13 | — | — | US | disclosed |
| US-20020146645-A1 | Multilayered body for photolithographic patterning | TACHIKAWA TOSHIKAZU (JP) | 2002-10-10 | — | — | US | disclosed |
| US-6455228-B1 | INTEGRALLY LAYERED BODY COMPRISING SUBSTRATE, WATER INSOLUBLE ANTIREFLECTION FILM, PHOTORESIST LAYER COMPRISING ALKALI SOLUBLE RESIN, ONIUM SALT PHOTOACID GENERATOR AND SUBSTITUTED GLYCOLURIL COMPOUND, WATER SOLUBLE ANTIREFLECTION COATING FILM | TOKYO OHKA KOGYO CO., LTD. (JP) | 2002-09-24 | — | — | US | disclosed |
| US-6406829-B1 | BLEND OF ALKALI-SOLUBLE RESIN, ONIUM SALT AND ETHYLENEUREA COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2002-06-18 | — | — | US | disclosed |
| US-20020061467-A1 | Negative-working photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2002-05-23 | — | — | US | disclosed |