Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 1/20 | 0.47 |
| ▸ | CA1 | P00915 | 3/20 | 0.43 |
| ▸ | CA2 | P00918 | 3/20 | 0.43 |
| ▸ | CA4 | P22748 | 3/20 | 0.43 |
| ▸ | MAPT | P10636 | 2/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.31 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.31 |
| ▸ | CA6 | P23280 | 2/20 | 0.31 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.30 |
| ▸ | MCL1 | Q07820 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL686204 | 0.98 | CA1 (0.45) | KMT2ACA1CA2CA4MAPT | |
| SCHEMBL685962 | 0.96 | KMT2A (0.42) | KMT2ACA1CA2CA4 | |
| SCHEMBL3210568 | 0.87 | CA1 (0.50) | KMT2ACA1CA2CA4MAPT | |
| SCHEMBL8166638 | 0.84 | KMT2A (0.35) | KMT2ACA1CA2CA4 | |
| Trifluoromethanesulfonic Acid SCHEMBL65803 | 0.84 | KMT2A (0.39) | KMT2ACA1CA2CA4MAPT | |
| SCHEMBL7749110 | 0.84 | KMT2A (0.39) | KMT2ACA1CA2CA4MAPT | |
| Trifluoromethanesulfonic Acid SCHEMBL3958924 | 0.84 | KMT2A (0.35) | KMT2ACA1CA2CA4MAPT | |
| Trifluoromethanesulfonic Acid SCHEMBL6140981 | 0.82 | CA1 (0.37) | KMT2ACA1CA2CA4MAPT | |
| Trifluoromethanesulfonic Acid SCHEMBL6140329 | 0.81 | KMT2A (0.35) | KMT2ACA1CA2CA4 | |
| SCHEMBL64538 | 0.80 | ALDH1A1 (0.40) | KMT2ACA1CA2MAPTALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 828 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4607278-A1 | CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT | Ycchem Co., Ltd. (KR) | 2025-08-27 | — | — | EP | claimed |
| US-20250199405-A1 | CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT | YCCHEM CO., LTD. (KR) | 2025-06-19 | — | — | US | claimed |
| WO-2024085293-A1 | CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT | 영창케미칼 주식회사 | 2024-04-25 | — | — | WO | claimed |
| EP-1710230-B1 | Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHINETSU CHEMICAL CO (JP) | 2013-08-14 | — | — | EP | claimed |
| EP-1780199-B1 | Novel fluorohydroxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHINETSU CHEMICAL CO (JP) | 2012-02-01 | — | — | EP | claimed |
| EP-1780198-B1 | Novel fluorosulfonyloxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHINETSU CHEMICAL CO (JP) | 2011-10-05 | — | — | EP | claimed |
| EP-1669421-B1 | Ink composition for a color filter, a color filter substrate manufactured using the ink composition and method of manufacturing a color filter substrate using the ink composition | SAMSUNG ELECTRONICS CO LTD (KR) | 2007-07-18 | — | — | EP | claimed |
| US-7122294-B2 | Photoacid generators with perfluorinated multifunctional anions | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2006-10-17 | — | — | US | claimed |
| US-7078444-B2 | Ionic photoacid generators with segmented hydrocarbonfluorocarbon sulfonate anions | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2006-07-18 | — | — | US | claimed |
| US-20050158655-A1 | Ionic photoacid generators with segmented hydrocarbonfluorocarbon sulfonate anions | 3M INNOVATIVE PROPERTIES COMPANY | 2005-07-21 | — | — | US | claimed |
| US-6841333-B2 | Ionic photoacid generators with segmented hydrocarbon-fluorocarbon sulfonate anions | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2005-01-11 | — | — | US | claimed |
| US-20040234888-A1 | Photoacid generators with perfluorinated multifunctional anions | 3M INNOVATIVE PROPERTIES COMPANY | 2004-11-25 | — | — | US | claimed |
| US-20040087690-A1 | Ionic photoacid generators with segmented hydrocarbon-fluorocarbon sulfonate anions | 3M INNOVATIVE PROPERTIES COMPANY | 2004-05-06 | — | — | US | claimed |
| US-20030207049-A1 | Liquid crystal display unit and method for manufacturing the same | NEC CORPORATION | 2003-11-06 | — | — | US | claimed |
| US-6440634-B1 | MICROFABRICATION OF INTEGRATED CIRCUITS, DEEP UV LITHOGRAPHY; PHENYLSULFONATE SALTS OF SULFONIUM OR IODINIUM CATIONS | SHIN-ETSU CHEMICAL CO., LTD (JP) | 2002-08-27 | — | — | US | claimed |
| US-12612500-B2 | Heat labile foam-in-place polyurethane foam | BATTELLE SAVANNAH RIVER ALLIANCE LLC (US) | 2026-04-28 | — | — | US | disclosed |
| US-20260093177-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-04-02 | — | — | US | disclosed |
| EP-0824223-A1 | Photosensitive resin composition for far-ultraviolet exposure | FUJI PHOTO FILM CO., LTD. (JP) | 1998-02-18 | — | — | EP | disclosed |
| EP-0789278-A2 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-08-13 | — | — | EP | disclosed |
| US-5585507-A | FINENESS PATTERNS | NEC CORPORATION (JP) | 1996-12-17 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12612500-B2 | Heat labile foam-in-place polyurethane foam | PUF60, OGG1, EIF3L | KMT2A 4114/4885CA1 2151/4885CA2 1065/4885 |
| US-20260093177-A1 | PATTERNING PROCESS | ARFGAP1, ARF1, ARF4 | KMT2A 893/4885CA1 197/4885CA2 1666/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.