SCHEMBL600088

SCHEMBL600088

C=COCCCOC=C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27767541 0.92 CDC25A (0.34)
SCHEMBL64718 0.92 CDC25A (0.34)
SCHEMBL12748104 0.90
SCHEMBL9646107 0.89 ALDH1A1 (0.38)
SCHEMBL3048726 0.89 ALDH1A1 (0.38)
SCHEMBL3107764 0.89 ALDH1A1 (0.38)
SCHEMBL18675767 0.89 ALDH1A1 (0.38)
SCHEMBL9644644 0.89 ALDH1A1 (0.38)
SCHEMBL22408792 0.89 ALDH1A1 (0.38)
SCHEMBL18699067 0.89 ALDH1A1 (0.38)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 361 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3523376-B1 COATING COMPOSITIONS INCLUDING DIAMOND AND EITHER CATIONIC CURABLE RESIN SYSTEMS OR THIOL-ENE CURABLE SYSTEMS AFI LICENSING LLC (US) 2022-04-20 EP claimed
EP-3523376-A1 COATING COMPOSITIONS INCLUDING DIAMOND AND EITHER CATIONIC CURABLE RESIN SYSTEMS OR THIOL-ENE CURABLE SYSTEMS AFI Licensing LLC (US) 2019-08-14 EP claimed
US-20190225832-A1 COATING COMPOSITIONS INCLUDING DIAMOND AND EITHER CATIONIC CURABLE RESIN SYSTEM OR THIOL-ENE CURABLE SYSTEMS AFI LICENSING LLC 2019-07-25 US claimed
CN-108271380-A Antifouling composition 佐敦公司 2018-07-10 CN claimed
WO-2018067634-A1 COATING COMPOSITIONS INCLUDING DIAMOND AND EITHER CATIONIC CURABLE RESIN SYSTEMS OR THIOL-ENE CURABLE SYSTEMS AFI LICENSING LLC (US) 2018-04-12 WO claimed
WO-2017009301-A1 ANTIFOULING COMPOSITION JOTUN A/S (NO) 2017-01-19 WO claimed
US-7026091-B2 Positive photoresist composition and patterning process using the same INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 2006-04-11 US claimed
US-7022790-B2 Photosensitive compositions based on polycyclic polymers SUMITOMO BAKELITE COMPANY, LTD. (JP) 2006-04-04 US claimed
EP-1532486-A1 PHOTOSENSITIVE COMPOSITIONS BASED ON POLYCYCLIC POLYMERS SUMITOMO BAKELITE CO., LTD. (JP) 2005-05-25 EP claimed
US-20050019691-A1 Positive photoresist composition and patterning process using the same INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 2005-01-27 US claimed
US-20040039153-A1 Photosensitive compositions based on polycyclic polymers SUMITOMO BAKELITE COMPANY, LTD. (JP) 2004-02-26 US claimed
WO-2004006020-A1 PHOTOSENSITIVE COMPOSITIONS BASED ON POLYCYCLIC POLYMERS SUMITOMO BAKELITE COMPANY, LTD. (JP) 2004-01-15 WO claimed
US-6368770-B1 CARBOXY NORBORNENE COMPOUND HYUNDAI ELECTRONICS INDUSTRIES CO. LTD. (KR) 2002-04-09 US claimed
EP-0579460-A2 Curable polyether composition GENERAL ELECTRIC COMPANY (US) 1994-01-19 EP claimed
US-20240199911-A1 HYBRID DUAL CURE COMPOSITIONS PRC-DESOTO INTERNATIONAL, INC. (US) 2024-06-20 US disclosed
US-20240132752-A1 COMPOSITIONS CONTAINING A FREE RADICAL POLYMERIZATION INITIATOR PRC-DESOTO INTERNATIONAL, INC. (US) 2024-04-25 US disclosed
CN-117659233-A Crosslinked material and application thereof 华为技术有限公司 2024-03-08 CN disclosed
EP-0447115-A1 Polyvinylether composition MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1991-09-18 EP disclosed
EP-0279005-A1 Semi-interpenetrating polymer networks ALLIED CORPORATION (US) 1988-08-24 EP disclosed
US-4654379-A VINYL ETHER AND CELLULOSE ESTER ALLIED CORPORATION (US) 1987-03-31 US disclosed