⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17556412 | 0.87 | — | — | |
| SCHEMBL17556455 | 0.87 | — | — | |
| SCHEMBL16499991 | 0.79 | — | — | |
| SCHEMBL1470777 | 0.78 | — | — | |
| SCHEMBL4059262 | 0.78 | — | — | |
| SCHEMBL2115687 | 0.74 | HRH3 (0.35) | — | |
| SCHEMBL8610 | 0.73 | — | — | |
| SCHEMBL10277 | 0.73 | — | — | |
| Ammonia Solution, Strong SCHEMBL6427158 | 0.69 | — | — | |
| SCHEMBL24425430 | 0.67 | ALDH1A1 (0.36) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 59 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11964957-B2 | Pyrazole derivative and harmful organism-controlling agent | KUMIAI CHEMICAL INDUSTRY CO., LTD. (JP) | 2024-04-23 | — | — | US | disclosed |
| EP-3808738-B1 | PYRAZOLE DERIVATIVE AND HARMFUL ORGANISM-CONTROLLING AGENT | KUMIAI CHEMICAL INDUSTRY CO (JP) | 2024-04-17 | — | — | EP | disclosed |
| CN-112236421-B | Pyrazole derivatives and pest control agents | 组合化学工业株式会社 | 2023-12-26 | — | — | CN | disclosed |
| CN-111315828-B | Composition, cured product, optical filter, and method for producing cured product | 株式会社艾迪科 | 2023-09-29 | — | — | CN | disclosed |
| CN-112154167-B | Composition, cured product, optical filter, and method for producing cured product | 株式会社艾迪科 | 2023-08-22 | — | — | CN | disclosed |
| US-11581567-B2 | Lithium ion battery and electrolyte thereof | CONTEMPORARY AMPEREX TECHNOLOGY CO., LIMITED (CN) | 2023-02-14 | — | — | US | disclosed |
| CN-110003271-B | Process for producing aromatic compound | 住友化学株式会社 | 2022-05-03 | — | — | CN | disclosed |
| EP-3808738-A1 | PYRAZOLE DERIVATIVE AND HARMFUL ORGANISM-CONTROLLING AGENT | Kumiai Chemical Industry Co., Ltd. (JP) | 2021-04-21 | — | — | EP | disclosed |
| US-10971757-B2 | Lithium-ion battery and its electrolyte | CONTEMPORARY AMPEREX TECHNOLOGY CO., LIMITED (CN) | 2021-04-06 | — | — | US | disclosed |
| CN-112236421-A | Pyrazole derivative and pest control agent | 组合化学工业株式会社 | 2021-01-15 | — | — | CN | disclosed |
| US-20040143082-A1 | Polysiloxane, process for production thereof and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2004-07-22 | — | — | US | disclosed |
| US-20040077669-A1 | Pyrimidine compounds and their use | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2004-04-22 | — | — | US | disclosed |
| EP-1398339-A1 | POLYSILOXANE, PROCESS FOR PRODUCTION THEREOF AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2004-03-17 | — | — | EP | disclosed |
| EP-1142928-B1 | Polysiloxane, method of manufacturing same, silicon-containing alicyclic compound, and radiation-sensitive resin compounds | JSR CORP (JP) | 2004-02-18 | — | — | EP | disclosed |
| EP-1366026-A2 | PYRIMIDINE COMPOUNDS AND THEIR USE | SUMITOMO CHEMICAL COMPANY LIMITED (JP) | 2003-12-03 | — | — | EP | disclosed |
| US-20030191268-A1 | Polysiloxane, method of manufacturing same, silicon-containing alicyclic compound, and radiation-sensitive resin composition | IWASAWA HARUO (JP) | 2003-10-09 | — | — | US | disclosed |
| US-6531260-B2 | Photoresist | JSR CORPORATION (JP) | 2003-03-11 | — | — | US | disclosed |
| WO-2002024663-A2 | PYRIMIDINE COMPOUNDS AND THEIR USE | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-03-28 | — | — | WO | disclosed |
| US-20010041769-A1 | Polysiloxane, method of manufacturing same, silicon-containingalicyclic compouns, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2001-11-15 | — | — | US | disclosed |
| EP-1142928-A1 | Polysiloxane, method of manufacturing same, silicon-containing alicyclic compound, and radiation-sensitive resin compounds | JSR Corporation (JP) | 2001-10-10 | — | — | EP | disclosed |