Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.52 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.52 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.52 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.52 |
| ▸ | TUBB4A | P04350 | 2/20 | 0.44 |
| ▸ | TUBB | P07437 | 2/20 | 0.44 |
| ▸ | TUBA3C | P0DPH7 | 2/20 | 0.44 |
| ▸ | TUBA1B | P68363 | 2/20 | 0.44 |
| ▸ | TUBA4A | P68366 | 2/20 | 0.44 |
| ▸ | TUBB4B | P68371 | 2/20 | 0.44 |
| ▸ | TUBB3 | Q13509 | 2/20 | 0.44 |
| ▸ | TUBB2A | Q13885 | 2/20 | 0.44 |
| ▸ | TUBB8 | Q3ZCM7 | 2/20 | 0.44 |
| ▸ | TUBA3E | Q6PEY2 | 2/20 | 0.44 |
| ▸ | TUBA1A | Q71U36 | 2/20 | 0.44 |
| ▸ | TUBA1C | Q9BQE3 | 2/20 | 0.44 |
| ▸ | TUBB6 | Q9BUF5 | 2/20 | 0.44 |
| ▸ | TUBB2B | Q9BVA1 | 2/20 | 0.44 |
| ▸ | TUBB1 | Q9H4B7 | 2/20 | 0.44 |
| ▸ | POLB | P06746 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30043755 | 1.00 | SMN1; SMN2 (0.52) | SMN1; SMN2KDM4EALDH1A1MAPK1TUBB4A | |
| SCHEMBL4617722 | 0.92 | ALDH1A1 (0.44) | SMN1; SMN2KDM4EALDH1A1MAPK1TUBB4A | |
| SCHEMBL21247472 | 0.90 | ALDH1A1 (0.42) | SMN1; SMN2KDM4EALDH1A1MAPK1TUBB4A | |
| SCHEMBL3838573 | 0.87 | SMN1; SMN2 (0.48) | SMN1; SMN2KDM4EALDH1A1MAPK1TUBB4A | |
| SCHEMBL601854 | 0.84 | GAA (0.40) | SMN1; SMN2ALDH1A1MAPK1TUBB4ATUBB | |
| SCHEMBL30043696 | 0.84 | GAA (0.40) | SMN1; SMN2ALDH1A1MAPK1TUBB4ATUBB | |
| SCHEMBL4022680 | 0.83 | SMN1; SMN2 (0.44) | SMN1; SMN2KDM4EALDH1A1MAPK1TUBB4A | |
| SCHEMBL8588357 | 0.83 | ALDH1A1 (0.52) | SMN1; SMN2KDM4EALDH1A1MAPK1TUBB4A | |
| SCHEMBL2858129 | 0.83 | KDM4E (0.52) | SMN1; SMN2KDM4EALDH1A1MAPK1TUBB4A | |
| SCHEMBL29868203 | 0.83 | ALDH1A1 (0.52) | SMN1; SMN2KDM4EALDH1A1MAPK1TUBB4A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 80 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11635688-B2 | Photoimageable compositions and processes for fabrication of relief patterns on low surface energy substrates | KAYAKU ADVANCED MATERIALS, INC. (US) | 2023-04-25 | — | — | US | claimed |
| US-20150024326-A1 | PHOTOIMAGEABLE COMPOSITIONS AND PROCESSES FOR FABRICATION OF RELIEF PATTERNS ON LOW SURFACE ENERGY SUBSTRATES | KAYAKU ADVANCED MATERIALS, INC. | 2015-01-22 | — | — | US | claimed |
| WO-2013134104-A2 | PHOTOIMAGEABLE COMPOSITIONS AND PROCESSES FOR FABRICATION OF RELIEF PATTERNS ON LOW SURFACE ENERGY SUBSTRATES | MICROCHEM CORP. (US) | 2013-09-12 | — | — | WO | claimed |
| WO-2025041519-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND CURED PRODUCT OF SAME | 日本化薬株式会社 | 2025-02-27 | — | — | WO | disclosed |
| US-12189291-B2 | Epoxy formulations and processes for fabrication of relief patterns on low surface energy substrates | KAYAKU ADVANCED MATERIALS, INC. (US) | 2025-01-07 | — | — | US | disclosed |
| US-20240168380-A1 | Photosensitive Resin Composition And Cured Product Therefrom | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 2024-05-23 | — | — | US | disclosed |
| US-11809078-B2 | Photosensitive resin composition, dry film resist, and cured objects obtained therefrom | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 2023-11-07 | — | — | US | disclosed |
| EP-2980058-B1 | COMPOSITION CONTAINING VINYL-GROUP-CONTAINING COMPOUND | TOKYO OHKA KOGYO CO LTD (JP) | 2023-05-03 | — | — | EP | disclosed |
| US-11635688-B2 | Photoimageable compositions and processes for fabrication of relief patterns on low surface energy substrates | KAYAKU ADVANCED MATERIALS, INC. (US) | 2023-04-25 | — | — | US | disclosed |
| CN-111217946-B | Composition comprising a compound containing a vinyl group | 东京应化工业株式会社 | 2022-12-06 | — | — | CN | disclosed |
| US-11142629-B2 | Hydrogen barrier agent, hydrogen barrier film forming composition, hydrogen barrier film, method for producing hydrogen barrier film, and electronic element | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-10-12 | — | — | US | disclosed |
| CN-1914561-A | Photoresist compositions and processess of use | MICROCHEM CORP (US) | 2007-02-14 | — | — | CN | disclosed |
| EP-1730592-A2 | PERMANENT RESIST COMPOSITION, CURED PRODUCT THEREOF, AND USE THEREOF | MicroChem Corp. (US) | 2006-12-13 | — | — | EP | disclosed |
| EP-1706791-A2 | PHOTORESIST COMPOSITIONS AND PROCESSESS OF USE | MacroChem Corporation (US) | 2006-10-04 | — | — | EP | disclosed |
| WO-2005079330-A2 | PERMANENT RESIST COMPOSITION, CURED PRODUCT THEREOF, AND USE THEREOF | MICROCHEM CORP. (US) | 2005-09-01 | — | — | WO | disclosed |
| US-20050176982-A1 | Method for producing onium salt derivatives, and novel onium salt derivatives | TOYO GOSEI KOGYO CO., LTD. (JP) | 2005-08-11 | — | — | US | disclosed |
| WO-2005067567-A2 | PHOTORESIST COMPOSITIONS AND PROCESSESS OF USE | MICROCHEM CORP. (US) | 2005-07-28 | — | — | WO | disclosed |
| US-20050147918-A1 | Photoresist compositions, hardened forms thereof, hardened patterns thereof and metal patterns formed using them | MicroChem Corp. a corporation of the state of Massachusetts, US | 2005-07-07 | — | — | US | disclosed |
| US-6620957-B1 | Process for producing onium salt derivative and novel onium salt derivative | TOYO GOSEI KOGYO CO., LTD. (JP) | 2003-09-16 | — | — | US | disclosed |
| EP-1164127-A1 | PROCESS FOR PRODUCING ONIUM SALT DERIVATIVE AND NOVEL ONIUM SALT DERIVATIVE | Toyo Gosei Kogyo Co., Ltd. (JP) | 2001-12-19 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20050176982-A1 | Method for producing onium salt derivatives, and novel onium salt derivatives | STS, NANS, GRIK5 | SMN1; SMN2 4269/4885KDM4E 2869/4885ALDH1A1 2710/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.