SCHEMBL601251

SCHEMBL601251

Nc1cccc(-c2c3ccccc3nc3ccccc23)c1

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 3/20 0.56
ESR2 Q92731 3/20 0.56
MAOA P21397 2/20 0.55
KDM4E B2RXH2 7/20 0.51
ALDH1A1 P00352 7/20 0.51
RAB9A P51151 6/20 0.51
HPGD P15428 6/20 0.51
KMT2A Q03164 5/20 0.51
NPC1 O15118 4/20 0.51
MAPT P10636 4/20 0.51
LMNA P02545 4/20 0.51
MEN1 O00255 3/20 0.51
GLA P06280 4/20 0.50
SMN1; SMN2 Q16637 3/20 0.50
HSD17B10 Q99714 3/20 0.50
ACHE P22303 2/20 0.50
CASP1 P29466 2/20 0.50
CASP7 P55210 2/20 0.50
TP53 P04637 2/20 0.50
NFKB1 P19838 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29834189 1.00 ESR1 (0.56) ESR1ESR2MAOAKDM4EALDH1A1
SCHEMBL12337344 0.84 MAOA (0.64) MAOAKDM4EALDH1A1HPGDKMT2A
SCHEMBL4935631 0.84 MAOA (0.62) MAOAKDM4EALDH1A1RAB9AHPGD
SCHEMBL11704426 0.84 ESR1 (0.64) ESR1ESR2MAOAKDM4EALDH1A1
SCHEMBL29274261 0.82 ESR1 (0.61) ESR1ESR2MAOAKDM4EALDH1A1
SCHEMBL29514776 0.80 ESR1 (0.73) ESR1ESR2MAOAKDM4EALDH1A1
SCHEMBL194068 0.80 ESR1 (0.73) ESR1ESR2MAOAKDM4EALDH1A1
SCHEMBL11454787 0.79 ESR1 (0.57) ESR1ESR2MAOAKDM4EALDH1A1
SCHEMBL21131542 0.79 RAD51 (0.54) MAOAKDM4EALDH1A1RAB9AHPGD
SCHEMBL29834190 0.79 ESR1 (0.56) ESR1ESR2MAOAKDM4EALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108241259-B Resist composition with good hole masking function and capable of directly depicting, exposing and imaging 杭州福斯特电子材料有限公司 2021-08-10 CN claimed
CN-113156764-B Photosensitive resin composition and resist laminate 杭州福斯特电子材料有限公司 2024-04-26 CN disclosed
CN-115047714-A Resist composition and laminate thereof 杭州福斯特电子材料有限公司 2022-09-13 CN disclosed
CN-108241259-B Resist composition with good hole masking function and capable of directly depicting, exposing and imaging 杭州福斯特电子材料有限公司 2021-08-10 CN disclosed
CN-113156764-A Photosensitive resin composition and resist laminate 浙江福斯特新材料研究院有限公司 2021-07-23 CN disclosed
US-20120040290-A1 PHOTOSENSITIVE RESIN COMPOSITION, AND PHOTOSENSITIVE ELEMENT, RESIST PATTERN FORMATION METHOD AND PRINTED CIRCUIT BOARD PRODUCTION METHOD EACH UTILIZING SAME HITACHI CHEMICAL COMPANY, LTD. (JP) 2012-02-16 US disclosed