⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3055659 | 0.73 | — | — | |
| SCHEMBL1414105 | 0.73 | — | — | |
| SCHEMBL15618502 | 0.72 | — | — | |
| SCHEMBL9524515 | 0.71 | — | — | |
| SCHEMBL5881410 | 0.69 | — | — | |
| SCHEMBL755012 | 0.69 | — | — | |
| SCHEMBL7103337 | 0.69 | — | — | |
| SCHEMBL216833 | 0.67 | — | — | |
| SCHEMBL9059143 | 0.67 | — | — | |
| SCHEMBL10911277 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2955576-B1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHINETSU CHEMICAL CO (JP) | 2020-07-22 | — | — | EP | disclosed |
| CN-100563056-C | Lithium secondary battery | MITSUBISHI CHEM CORP (JP) | 2009-11-25 | — | — | CN | disclosed |
| CN-101203982-A | Lithium secondary battery | MITSUBISHI CHEM CORP (JP) | 2008-06-18 | — | — | CN | disclosed |
| US-7155152-B2 | Method of image transfer, method of and apparatus for image forming | RICOH COMPANY, LTD. (JP) | 2006-12-26 | — | — | US | disclosed |
| US-20040126148-A1 | Method of image transfer, method of and apparatus for image forming | RICOH COMPANY, LTD. (JP) | 2004-07-01 | — | — | US | disclosed |
| CN-1479769-A | Radiation-sensitive refractive index-changeable composition and refractive index changing method | ������ʱ����ʽ���� | 2004-03-03 | — | — | CN | disclosed |
| US-4237217-A | IN WHICH COUPLING POSITION IS SUBSTITUTED WITH A SULFONAMIDO GROUP | FUJI PHOTO FILM CO., LTD. (JP) | 1980-12-02 | — | — | US | disclosed |