⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| 2-Methoxyethanol SCHEMBL1317307 | 0.96 | TSHR (0.47) | — | |
| 2-Methoxyethanol SCHEMBL310 | 0.96 | — | — | |
| 2-Methoxyethanol SCHEMBL5050349 | 0.92 | — | — | |
| 2-Methoxyethanol SCHEMBL7703885 | 0.92 | TSHR (0.44) | — | |
| 2-Methoxyethanol SCHEMBL3715505 | 0.92 | — | — | |
| 2-Methoxyethanol SCHEMBL8506499 | 0.92 | — | — | |
| 2-Methoxyethanol SCHEMBL845462 | 0.92 | — | — | |
| 2-Methoxyethanol SCHEMBL3810075 | 0.92 | — | — | |
| 2-Methoxyethanol SCHEMBL21403186 | 0.92 | — | — | |
| 2-Methoxyethanol SCHEMBL3886889 | 0.92 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116376050-A | Preparation method of water-based organic silicon composition | 南京瑞思化学技术有限公司 | 2023-07-04 | — | — | CN | disclosed |
| CN-115873505-A | Water-based environment-friendly coating and preparation method thereof | 江苏扬瑞新材料有限公司 | 2023-03-31 | — | — | CN | disclosed |
| CN-114068300-A | Spin-on carbon composition and method for manufacturing semiconductor device | 台湾积体电路制造股份有限公司 | 2022-02-18 | — | — | CN | disclosed |
| CN-104974296-A | Preparation method of resin for waterborne wood sealing primer with formaldehyde capturing function | UNION FOSHAN CHEMICAL CO LTD | 2015-10-14 | — | — | CN | disclosed |
| US-7046952-B2 | Fixing apparatus and image forming apparatus | RICOH COMPANY, LTD. (JP) | 2006-05-16 | — | — | US | disclosed |
| US-20050254867-A1 | Fixing apparatus and image forming apparatus | KUROTORI TSUNEO | 2005-11-17 | — | — | US | disclosed |
| US-6947700-B2 | Fixing apparatus and image forming apparatus | RICOH COMPANY, LTD. (JP) | 2005-09-20 | — | — | US | disclosed |
| US-20040131402-A1 | Fixing apparatus and image forming apparatus | RICOH COMPANY, LTD. (JP) | 2004-07-08 | — | — | US | disclosed |
| EP-0721398-B1 | PROCESS FOR PREPARING IMPROVED LITHOGRAPHIC PRINTING PLATES | BAYER AG (US) | 1998-07-08 | — | — | EP | disclosed |
| EP-0721398-A1 | PROCESS FOR PREPARING IMPROVED LITHOGRAPHIC PRINTING PLATES | HOECHST CELANESE CORPORATION (US) | 1996-07-17 | — | — | EP | disclosed |
| US-5432046-A | Process for preparing improved lithographic printing plates by brushgraining with alumina/quartz slurry | HOECHST CELANESE CORPORATION (US) | 1995-07-11 | — | — | US | disclosed |
| WO-1995009087-A1 | PROCESS FOR PREPARING IMPROVED LITHOGRAPHIC PRINTING PLATES | HOECHST CELANESE CORPORATION (US) | 1995-04-06 | — | — | WO | disclosed |
| US-4053314-A | FLUOROCARBON NONIONIC SURFACTANTS | KABUSHIKI KAISHA BUNSHODO (JA) | 1977-10-11 | — | — | US | disclosed |