Known targets — ChEMBL curated mechanism
ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3376101 | 0.96 | — | — | |
| Hydrochloric Acid SCHEMBL28682434 | 0.95 | — | — | |
| SCHEMBL11150746 | 0.92 | — | — | |
| SCHEMBL2194983 | 0.90 | — | — | |
| Hydrochloric Acid SCHEMBL6015213 | 0.88 | — | — | |
| SCHEMBL5685624 | 0.87 | — | — | |
| SCHEMBL9725567 | 0.87 | — | — | |
| Sulfuric Acid SCHEMBL9725585 | 0.87 | MEN1 (0.30) | — | |
| Hydrochloric Acid SCHEMBL9661707 | 0.87 | — | — | |
| SCHEMBL10613043 | 0.84 | SLC29A1 (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-4273842-A | Process for forming patternwise coated powder layer | HITACHI, LTD. (JP) | 1981-06-16 | — | — | US | claimed |
| US-4104072-A | Water developable lithographic printing plate having dual photosensitive layering | POLYCHROME CORPORATION (US) | 1978-08-01 | — | — | US | claimed |
| EP-1558446-B1 | THERMAL GENERATION OF A MASK FOR FLEXOGRAPHY | KODAK POLYCHROME GRAPHICS LLC (US) | 2006-08-16 | — | — | EP | disclosed |
| US-6960419-B2 | Antihalation dye for negative-working printing plates | KODAK POLYCHROME GRAPHICS LLC (US) | 2005-11-01 | — | — | US | disclosed |
| EP-1558446-A1 | THERMAL GENERATION OF A MASK FOR FLEXOGRAPHY | Kodak Polychrome Graphics, LLC (US) | 2005-08-03 | — | — | EP | disclosed |
| US-20050130064-A1 | ANTIHALATION DYE FOR NEGATIVE-WORKING PRINTING PLATES | CITICORP NORTH AMERICA, INC., AS AGENT | 2005-06-16 | — | — | US | disclosed |
| US-6794107-B2 | THERMALLY IMAGEABLE VESICULAR IMAGING COMPOSITION COMPRISING SENSITIZER, POLYMER, AND PHOTOTHERMAL CONVERSION MATERIAL; EXPOSURE TO ULTRAVIOLET AND/OR VISIBLE RADIATION; DEVELOPMENT TO PRODUCE PRINTING PLATE | KODAK POLYCHROME GRAPHICS LLC | 2004-09-21 | — | — | US | disclosed |
| WO-2004039601-A1 | THERMAL GENERATION OF A MASK FOR FLEXOGRAPHY | KODAK POLYCHROME GRAPHICS LLC (US) | 2004-05-13 | — | — | WO | disclosed |
| US-20040081908-A1 | Thermal generation of a mask for flexography | EASTMAN KODAK COMPANY | 2004-04-29 | — | — | US | disclosed |
| EP-0496017-A1 | Heat-sensitive recording medium | HONSHU PAPER CO., LTD. (JP) | 1992-07-29 | — | — | EP | disclosed |
| US-4785062-A | Reaction product of O-epoxyalkylated tetrakis(hydroxyphenyl)ethane resin and phenol with product having no remaining epoxy groups | W. R. GRACE & CO.-CONN. (US) | 1988-11-15 | — | — | US | disclosed |
| US-4306007-A | Process of making and using fade-resistant diazo microfilm | AM INTERNATIONAL, INC. (US) | 1981-12-15 | — | — | US | disclosed |
| US-4273842-A | Process for forming patternwise coated powder layer | HITACHI, LTD. (JP) | 1981-06-16 | — | — | US | disclosed |
| US-4233390-A | WATER SOLUBLE DIAZO RESIN COATED WITH PHOTOPOLYMERIZABLE COMPOSITION | POLYCHROME CORPORATION (US) | 1980-11-11 | — | — | US | disclosed |
| US-4104072-A | Water developable lithographic printing plate having dual photosensitive layering | POLYCHROME CORPORATION (US) | 1978-08-01 | — | — | US | disclosed |
| US-4093463-A | NITROGEN, LIGHT SENSITIVE | EASTMAN KODAK COMPANY (US) | 1978-06-06 | — | — | US | disclosed |
| US-4060420-A | PHOTOGRAPHY | EASTMAN KODAK COMPANY (US) | 1977-11-29 | — | — | US | disclosed |
| US-4012260-A | THIAZOLINIUM COMPOUNDS | EASTMAN KODAK COMPANY (US) | 1977-03-15 | — | — | US | disclosed |
| US-3933423-A | Azoic dyeing of leather | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1976-01-20 | — | — | US | disclosed |
| US-3933499-A | Printing plate comprising diazo-borofluoride and diazo resin layers | LITH-KEM CORPORATION (US) | 1976-01-20 | — | — | US | disclosed |