Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PTPN1 | P18031 | 3/20 | 0.41 |
| ▸ | MAPT | P10636 | 5/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.34 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.34 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.34 |
| ▸ | HPGD | P15428 | 2/20 | 0.34 |
| ▸ | PTPN22 | Q9Y2R2 | 1/20 | 0.34 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.31 |
| ▸ | APAF1 | O14727 | 2/20 | 0.31 |
| ▸ | TDP2 | O95551 | 2/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.31 |
| ▸ | MEN1 | O00255 | 3/20 | 0.31 |
| ▸ | CDC25B | P30305 | 2/20 | 0.31 |
| ▸ | PGAM1 | P18669 | 1/20 | 0.31 |
| ▸ | POLB | P06746 | 3/20 | 0.31 |
| ▸ | RECQL | P46063 | 3/20 | 0.31 |
| ▸ | ATM | Q13315 | 2/20 | 0.31 |
| ▸ | USP2 | O75604 | 2/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11650825 | 0.98 | PTPN1 (0.40) | PTPN1MAPTKDM4EMAPK1ALDH1A1 | |
| SCHEMBL13155734 | 0.87 | PTPN1 (0.41) | PTPN1MAPTKDM4EMAPK1ALDH1A1 | |
| SCHEMBL9245580 | 0.83 | TSHR (0.31) | PTPN1SMN1; SMN2TSHR | |
| SCHEMBL278744 | 0.83 | PTPN1 (0.41) | PTPN1MAPTKDM4EMAPK1ALDH1A1 | |
| SCHEMBL11650821 | 0.82 | PTPN1 (0.65) | PTPN1MAPTKDM4EMAPK1ALDH1A1 | |
| SCHEMBL7528393 | 0.79 | PTPN1 (0.51) | PTPN1MAPTKDM4EMAPK1ALDH1A1 | |
| SCHEMBL366178 | 0.78 | PTPN1 (0.63) | PTPN1MAPTKDM4EMAPK1ALDH1A1 | |
| SCHEMBL29397292 | 0.78 | PTPN1 (0.63) | PTPN1MAPTKDM4EMAPK1ALDH1A1 | |
| SCHEMBL3398101 | 0.78 | PTPN1 (0.39) | PTPN1MAPTKDM4EMAPK1ALDH1A1 | |
| SCHEMBL3399109 | 0.78 | PTPN1 (0.39) | PTPN1MAPTKDM4EMAPK1ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0323427-B2 | Light-sensitive compositions with phenol resins and quinone diarides | UCB SA (BE) | 1999-03-03 | — | — | EP | claimed |
| US-5272026-A | Negative image process utilizing photosensitive compositions containing aromatic fused polycyclic sulfonic acid and partial ester or phenolic resin with diazoquinone sulfonic acid or diazoquinone carboxylic acid, and associated imaged article | UCB S.A. (BE) | 1993-12-21 | — | — | US | claimed |
| EP-0184567-B1 | PROCESS FOR THE FORMATION OF NEGATIVE PATTERNS IN A PHOTORESIST LAYER | UCB Electronics, S.A. (BE) | 1989-12-13 | — | — | EP | claimed |
| EP-1558446-B1 | THERMAL GENERATION OF A MASK FOR FLEXOGRAPHY | KODAK POLYCHROME GRAPHICS LLC (US) | 2006-08-16 | — | — | EP | disclosed |
| US-6960419-B2 | Antihalation dye for negative-working printing plates | KODAK POLYCHROME GRAPHICS LLC (US) | 2005-11-01 | — | — | US | disclosed |
| EP-1558446-A1 | THERMAL GENERATION OF A MASK FOR FLEXOGRAPHY | Kodak Polychrome Graphics, LLC (US) | 2005-08-03 | — | — | EP | disclosed |
| US-20050130064-A1 | ANTIHALATION DYE FOR NEGATIVE-WORKING PRINTING PLATES | CITICORP NORTH AMERICA, INC., AS AGENT | 2005-06-16 | — | — | US | disclosed |
| US-6794107-B2 | THERMALLY IMAGEABLE VESICULAR IMAGING COMPOSITION COMPRISING SENSITIZER, POLYMER, AND PHOTOTHERMAL CONVERSION MATERIAL; EXPOSURE TO ULTRAVIOLET AND/OR VISIBLE RADIATION; DEVELOPMENT TO PRODUCE PRINTING PLATE | KODAK POLYCHROME GRAPHICS LLC | 2004-09-21 | — | — | US | disclosed |
| WO-2004039601-A1 | THERMAL GENERATION OF A MASK FOR FLEXOGRAPHY | KODAK POLYCHROME GRAPHICS LLC (US) | 2004-05-13 | — | — | WO | disclosed |
| US-20040081908-A1 | Thermal generation of a mask for flexography | EASTMAN KODAK COMPANY | 2004-04-29 | — | — | US | disclosed |
| EP-0749593-B1 | LIGHT-SENSITIVE MATERIAL FOR PHOTOGRAPHIC AND REPROGRAPHIC APPLICATIONS | EMTEC MAGNETICS GMBH (DE) | 1997-12-29 | — | — | EP | disclosed |
| WO-1995024672-A1 | LIGHT-SENSITIVE MATERIAL FOR PHOTOGRAPHIC AND REPROGRAPHIC APPLICATIONS | BASF MAGNETICS GMBH (DE) | 1995-09-14 | — | — | WO | disclosed |
| US-5272026-A | Negative image process utilizing photosensitive compositions containing aromatic fused polycyclic sulfonic acid and partial ester or phenolic resin with diazoquinone sulfonic acid or diazoquinone carboxylic acid, and associated imaged article | UCB S.A. (BE) | 1993-12-21 | — | — | US | disclosed |
| US-5116715-A | Contrast, resolution, photoresists | U C B S.A. (BE) | 1992-05-26 | — | — | US | disclosed |
| EP-0109286-A2 | Image stabilizers for vesicular film | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1984-05-23 | — | — | EP | disclosed |
| US-4430414-A | BENZOIC ACID DERIVATIVES AS STABILIZERS FOR HOMO-(OR CO-)POLYMERS OF CHLOROACRYLONITRILE AND LIGHT SENSITIVE AGENT | MINNESOTA MINING & MANUFACTURING COMPANY (US) | 1984-02-07 | — | — | US | disclosed |
| US-4283477-A | POLYSULFONAMIDE SEPARATION POLYMER FOR STORAGE STABILITY | EASTMAN KODAK COMPANY (US) | 1981-08-11 | — | — | US | disclosed |
| US-4199359-A | Photographic screen stencil printing process | XEROX CORPORATION (US) | 1980-04-22 | — | — | US | disclosed |
| US-4103072-A | Method of producing diazotype photoprinting material | WEBER-VALENTINE COMPANY, INC. (US) | 1978-07-25 | — | — | US | disclosed |
| US-4016814-A | Planographic printing master | XEROX CORPORATION (US) | 1977-04-12 | — | — | US | disclosed |