SCHEMBL3398101

SCHEMBL3398101

[N-]=[N+]=C1C=C(S(=O)(=O)O)c2ccccc2C1=O

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PTPN1 P18031 3/20 0.39
MEN1 O00255 4/20 0.37
KMT2A Q03164 4/20 0.37
CDC25B P30305 2/20 0.37
TDP2 O95551 3/20 0.36
APAF1 O14727 2/20 0.36
MAPT P10636 5/20 0.35
MAPK1 P28482 3/20 0.35
MAOA P21397 3/20 0.35
SMN1; SMN2 Q16637 3/20 0.35
LMNA P02545 3/20 0.35
KDM4E B2RXH2 2/20 0.35
PLIN1 O60240 2/20 0.35
PLA2G1B P04054 2/20 0.35
PTPRC P08575 2/20 0.35
S100A4 P26447 2/20 0.35
HTT P42858 2/20 0.35
BLM P54132 2/20 0.35
PLIN5 Q00G26 2/20 0.35
ABHD5 Q8WTS1 2/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3399109 1.00 PTPN1 (0.39) PTPN1MEN1KMT2ACDC25BTDP2
Hydrochloric Acid SCHEMBL8031975 0.98 PTPN1 (0.38) PTPN1MEN1KMT2ACDC25BTDP2
SCHEMBL1705474 0.86 PTPN1 (0.39) PTPN1MEN1KMT2ACDC25BTDP2
SCHEMBL30773549 0.86 PTPN1 (0.39) PTPN1MEN1KMT2ACDC25BTDP2
SCHEMBL9245580 0.85 TSHR (0.31) PTPN1SMN1; SMN2TSHR
SCHEMBL9774897 0.83 PTPN1 (0.39) PTPN1MEN1KMT2ACDC25BTDP2
SCHEMBL819290 0.83 PTPN1 (0.39) PTPN1MEN1KMT2ACDC25BTDP2
SCHEMBL3951332 0.81 PTPN1 (0.62) PTPN1MEN1KMT2ACDC25BTDP2
Hydrochloric Acid SCHEMBL8031972 0.81 PTPN1 (0.38) PTPN1MEN1KMT2ACDC25BTDP2
SCHEMBL13155865 0.80 HTR6 (0.41) PTPN1MEN1KMT2ACDC25BTDP2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2137140-B1 NOVEL DIAZONAPHTHOQUINONESULFONIC ACID BISPHENOL DERIVATIVE USEFUL IN PHOTO LITHOGRAPHIC SUB MICRON PATTERNING AND A PROCESS FOR PREPARATION THEREOF COUNCIL SCIENT IND RES (IN) 2010-11-10 EP claimed
CN-118922781-A Positive photosensitive resin composition, cured film, and semiconductor device 住友电木株式会社 2024-11-08 CN disclosed
CN-114667486-A PAG-free positive-working chemically amplified resist composition and method of using the same 默克专利股份有限公司 2022-06-24 CN disclosed
EP-2137140-B1 NOVEL DIAZONAPHTHOQUINONESULFONIC ACID BISPHENOL DERIVATIVE USEFUL IN PHOTO LITHOGRAPHIC SUB MICRON PATTERNING AND A PROCESS FOR PREPARATION THEREOF COUNCIL SCIENT IND RES (IN) 2010-11-10 EP disclosed