SCHEMBL6029210

SCHEMBL6029210

ON=C1[C]=CC=CC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6093513 0.73
SCHEMBL7614086 0.71
SCHEMBL5061830 0.71
SCHEMBL9615432 0.69 ALDH1A1 (0.31)
SCHEMBL8710345 0.62
SCHEMBL2984 0.62
SCHEMBL641199 0.62
SCHEMBL9407651 0.62
SCHEMBL13858963 0.57
SCHEMBL6922404 0.55

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0006152-A1 Process for preparing 2-oximinophenylacetonitrile BAYER AG (DE) 1980-01-09 EP claimed
CN-108463492-B Hard coat laminated film 理研科技株式会社 2024-04-26 CN disclosed
US-11773229-B2 Hard coat laminated film RIKEN TECHNOS CORPORATION 2023-10-03 US disclosed
CN-111741848-B Anti-dazzle hard coating laminated film 理研科技株式会社 2023-08-18 CN disclosed
EP-3756885-A1 ANTIGLARE HARDCOAT MULTILAYER FILM Riken Technos Corporation (JP) 2020-12-30 EP disclosed
US-20200398541-A1 ANTIGLARE HARDCOAT MULTILAYER FILM RIKEN TECHNOS CORPORATION (JP) 2020-12-24 US disclosed
US-10596795-B2 Decorative-sheet manufacturing method RIKEN TECHNOS CORPORATION (JP) 2020-03-24 US disclosed
EP-3623153-A1 HARD COAT LAMINATED FILM Riken Technos Corporation (JP) 2020-03-18 EP disclosed
US-20200061983-A1 HARD COAT LAMINATED FILM RIKEN TECHNOS CORPORATION (JP) 2020-02-27 US disclosed
US-20170217145-A1 DECORATIVE-SHEET MANUFACTURING METHOD RIKEN TECHNOS CORPORATION (JP) 2017-08-03 US disclosed
EP-1633336-B1 IMMUNOSUPPRESSANT COMPOUNDS AND COMPOSITIONS NOVARTIS AG (CH) 2016-06-22 EP disclosed
CN-102174024-B 2,4-pyrimidinediamine compounds and their uses RIGEL PHARMACEUTICALS INC 2015-02-11 CN disclosed
CN-102591152-A Resist composition and patterning process SHIN ETSU EHEMICAL CO LTD 2012-07-18 CN disclosed
CN-102520581-A Method for forming photoresist pattern SHINETSU CHEMICAL CO 2012-06-27 CN disclosed
CN-101625523-A Resist patterning process and manufacturing photo mask SHINETSU CHEMICAL CO 2010-01-13 CN disclosed
CN-101625524-A Photoresist composition and pattern forming method SHINETSU CHEMICAL CO 2010-01-13 CN disclosed
US-7115608-B2 Pyridinone and pyridinethione derivatives having HIV inhibiting properties CENTRE NATIONAL DE LA RECHERCHE SCHENTIFIQUE (FR) 2006-10-03 US disclosed
US-20050176727-A1 Oximes and hydrazones that are useful in treating sexual dysfunction ABBOTT LABORATORIES 2005-08-11 US disclosed
US-20040229847-A1 Pyridinone and pyridinethione derivatives having hiv inhibiting properties CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS) (FR) 2004-11-18 US disclosed
US-4351935-A FOR CURING AN AMINO RESIN AKZO N.V. (NL) 1982-09-28 US disclosed