SCHEMBL6033369

SCHEMBL6033369

C[Si](C)(Cl)CCCCN

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4534546 0.97 DNM1 (0.44)
SCHEMBL4535654 0.97 DNM1 (0.44)
SCHEMBL4532412 0.97 DNM1 (0.44)
SCHEMBL4533865 0.97 DNM1 (0.44)
SCHEMBL4527372 0.97 DNM1 (0.44)
SCHEMBL4534385 0.97 DNM1 (0.44)
SCHEMBL4519307 0.97 DNM1 (0.44)
SCHEMBL4529145 0.97 DNM1 (0.44)
SCHEMBL4531697 0.97 DNM1 (0.44)
SCHEMBL4539418 0.97 DNM1 (0.44)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11807758-B2 Siloxane polymer and method of producing siloxane polymer JNC CORPORATION (JP) 2023-11-07 US disclosed
US-20210238419-A1 SILOXANE POLYMER AND METHOD OF PRODUCING SILOXANE POLYMER JNC CORPORATION (JP) 2021-08-05 US disclosed
WO-2006002616-A1 COMPOSITE MATERIALS COMPRISING TETRAETHER LIPIDS AND PRODUCTION OF SAID MATERIALS SURFACE AND INTERFACE TECHNOLOGIES ROSENHOF GMBH (DE) 2006-01-12 WO disclosed
US-20040180193-A1 Resin composition, filler, and method of producing resin composition NISSAN MOTOR CO., LTD. 2004-09-16 US disclosed
EP-1457521-A1 Resin composition, filler, and method of producing resin composition NISSAN MOTOR CO., LTD. (JP) 2004-09-15 EP disclosed