Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 2/20 | 0.52 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.52 |
| ▸ | MAPT | P10636 | 2/20 | 0.47 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.47 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.45 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.45 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.44 |
| ▸ | HDAC4 | P56524 | 1/20 | 0.44 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.44 |
| ▸ | HDAC7 | Q8WUI4 | 1/20 | 0.44 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.44 |
| ▸ | HDAC10 | Q969S8 | 1/20 | 0.44 |
| ▸ | HDAC11 | Q96DB2 | 1/20 | 0.44 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.44 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.44 |
| ▸ | HDAC9 | Q9UKV0 | 1/20 | 0.44 |
| ▸ | HDAC5 | Q9UQL6 | 1/20 | 0.44 |
| ▸ | CYP2C9 | P11712 | 3/20 | 0.42 |
| ▸ | KCNN4 | O15554 | 1/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3304253 | 0.87 | CYP1A2 (0.57) | CYP1A2CYP2D6MAPTKMT2AHIF1A | |
| SCHEMBL28393924 | 0.87 | CYP1A2 (0.47) | CYP1A2CYP2D6MAPTKMT2AHIF1A | |
| SCHEMBL28727642 | 0.85 | CYP1A2 (0.55) | CYP1A2CYP2D6MAPTKMT2AHIF1A | |
| SCHEMBL28727574 | 0.85 | CYP1A2 (0.55) | CYP1A2CYP2D6MAPTKMT2AHIF1A | |
| SCHEMBL10445349 | 0.83 | CYP2D6 (0.48) | CYP1A2CYP2D6MAPTKMT2AHIF1A | |
| SCHEMBL17065513 | 0.83 | CYP1A2 (0.48) | CYP1A2CYP2D6MAPTKMT2AHIF1A | |
| SCHEMBL1666946 | 0.83 | CYP1A2 (0.53) | CYP1A2CYP2D6MAPTKMT2AHIF1A | |
| SCHEMBL5165367 | 0.83 | CYP1A2 (0.48) | CYP1A2CYP2D6MAPTKMT2AHIF1A | |
| SCHEMBL6449832 | 0.82 | CYP2D6 (0.47) | CYP1A2CYP2D6MAPTKMT2AHIF1A | |
| SCHEMBL3159723 | 0.80 | KIF11 (0.48) | CYP1A2CYP2D6MAPTKMT2AHIF1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2762565-B1 | NOVEL AMIDASE | KANEKA CORP (JP) | 2016-11-30 | — | — | EP | disclosed |
| US-9493762-B2 | Vector, a transformant and a method to produce a polypeptide having activity to selectively hydrolyze a (R)-tropic acid amide in a racemic mixture | KANEKA CORPORATION (JP) | 2016-11-15 | — | — | US | disclosed |
| US-8906598-B2 | Pattern forming method, method for manufacturing semiconductor device, and material for forming coating layer of resist pattern | FUJITSU LIMITED (JP) | 2014-12-09 | — | — | US | disclosed |
| US-20140335575-A1 | NOVEL AMIDASE | KANEKA CORPORATION (JP) | 2014-11-13 | — | — | US | disclosed |
| EP-2762565-A1 | NOVEL AMIDASE | Kaneka Corporation (JP) | 2014-08-06 | — | — | EP | disclosed |
| US-8476346-B2 | Resist pattern thickening material, semiconductor device, and production method thereof | FUJITSU LIMITED (JP) | 2013-07-02 | — | — | US | disclosed |
| US-20120126372-A1 | RESIST PATTERN THICKENING MATERIAL AND PROCESS FOR FORMING RESIST PATTERN, AND SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME | FUJITSU LIMITED (JP) | 2012-05-24 | — | — | US | disclosed |
| US-8129092-B2 | Resist pattern thickening material and process for forming resist pattern, and semiconductor device and method for manufacturing the same | FUJITSU LIMITED (JP) | 2012-03-06 | — | — | US | disclosed |
| US-20110250541-A1 | PATTERN FORMING METHOD, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND MATERIAL FOR FORMING COATING LAYER OF RESIST PATTERN | FUJITSU LIMITED (JP) | 2011-10-13 | — | — | US | disclosed |
| US-20110101508-A1 | RESIST PATTERN THICKENING MATERIAL, SEMICONDUCTOR DEVICE, AND PRODUCTION METHOD THEREOF | FUJITSU LIMITED (JP) | 2011-05-05 | — | — | US | disclosed |
| CN-1975571-B | Resist pattern thickening material and process for forming resist pattern, and semiconductor device and method for manufacturing the same | FUJITSU LTD | 2011-04-06 | — | — | CN | disclosed |
| EP-1793274-A2 | Resist pattern thickening material and process for forming resist pattern, and semiconductor device and method for manufacturing the same | FUJITSU LIMITED (JP) | 2007-06-06 | — | — | EP | disclosed |
| CN-1975571-A | Resist pattern thickening material and process for forming resist pattern, and semiconductor device and method for manufacturing the same | FUJITSU LTD (JP) | 2007-06-06 | — | — | CN | disclosed |
| US-20070123623-A1 | Resist pattern thickening material and process for forming resist pattern, and semiconductor device and method for manufacturing the same | FUJITSU LIMITED (JP) | 2007-05-31 | — | — | US | disclosed |