SCHEMBL6045306

SCHEMBL6045306

C=C(C)C(=O)OOS(=O)(=O)CCC

nearest known ligand 0.39

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.39
ALDH1A1 P00352 2/20 0.37
THRB P10828 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11193623 0.89 TSHR (0.44) TSHRALDH1A1THRB
SCHEMBL2867756 0.86 ALDH1A1 (0.41) TSHRALDH1A1THRB
SCHEMBL29157007 0.84 TSHR (0.49) TSHRTHRB
SCHEMBL10912318 0.84 TSHR (0.49) TSHRTHRB
SCHEMBL28968217 0.84 TSHR (0.49) TSHRTHRB
SCHEMBL1255357 0.84 ALDH1A1 (0.39) TSHRALDH1A1THRB
SCHEMBL1255334 0.84 ALDH1A1 (0.39) TSHRALDH1A1THRB
SCHEMBL29167456 0.84 ALDH1A1 (0.39) TSHRALDH1A1THRB
Ammonia Solution, Strong SCHEMBL1252867 0.84 ALDH1A1 (0.39) TSHRALDH1A1THRB
SCHEMBL29167479 0.84 ALDH1A1 (0.39) TSHRALDH1A1THRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0168212-B1 COLORING MATERIAL AND PROCESS FOR PREPARATION THEREOF Tosoh Corporation (JP) 1992-04-15 EP claimed
US-10483011-B2 Conductive composition, conductive composition production method, anti-static resin composition and antistatic resin film SHIN-ETSU POLYMER CO., LTD. (JP) 2019-11-19 US disclosed
US-20150348670-A1 CURABLE ANTISTATIC ORGANOPOLYSILOXANE COMPOSITION AND ANTISTATIC SILICONE FILM SHIN-ETSU POLYMER CO., LTD. (JP) 2015-12-03 US disclosed
US-20150348671-A1 CONDUCTIVE COMPOSITION, CONDUCTIVE COMPOSITION PRODUCTION METHOD, ANTI-STATIC RESIN COMPOSITION AND ANTISTATIC RESIN FILM SHIN-ETSU POLYMER CO., LTD. (JP) 2015-12-03 US disclosed
US-20060093781-A1 Pile fabric KANEKA CORPORATION (JP) 2006-05-04 US disclosed
EP-1536047-A1 PILE FABRIC KANEKA CORPORATION (JP) 2005-06-01 EP disclosed
US-5976693-A SURFACE COATED WITH POLYSILOXANE; ROUGHNESS KANEKA CORPORATION (JP) 1999-11-02 US disclosed
EP-0353714-B1 Silver halide photographic photosensitive materials FUJI PHOTO FILM CO LTD (JP) 1997-01-22 EP disclosed
US-5260177-A Cyan dye-forming coupler, pivaloylacetoanilide yellow coupler, pyrazoloazole magenta coupler FUJI PHOTO FILM CO., LTD. (JP) 1993-11-09 US disclosed
EP-0168212-B1 COLORING MATERIAL AND PROCESS FOR PREPARATION THEREOF Tosoh Corporation (JP) 1992-04-15 EP disclosed
EP-0353714-A2 Silver halide photographic photosensitive materials FUJI PHOTO FILM CO., LTD. (JP) 1990-02-07 EP disclosed
US-4740549-A Ink composition for writing board TOYO SODA MANUFACTURING CO., LTD. (JP) 1988-04-26 US disclosed
EP-0209367-A1 Ink composition for writing board TOSOH CORPORATION (JP) 1987-01-21 EP disclosed
US-4446291-A REDOX CATALYST, SULFITE, PEROXYDISULFATE BAYER AKTIENGESELLSCHAFT (DE) 1984-05-01 US disclosed
US-4334046-A POLYMERIZED IN THE PRESENCE OF AN IRON SALT AND CITRIC ACID BAYER AKTIENGESELLSCHAFT (DE) 1982-06-08 US disclosed