Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CES1 | P23141 | 3/20 | 0.46 |
| ▸ | SRC | P12931 | 1/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.38 |
| ▸ | POLB | P06746 | 2/20 | 0.38 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.37 |
| ▸ | LMNA | P02545 | 2/20 | 0.37 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.36 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.36 |
| ▸ | MEN1 | O00255 | 2/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.36 |
| ▸ | NPC1 | O15118 | 1/20 | 0.36 |
| ▸ | MAPT | P10636 | 1/20 | 0.36 |
| ▸ | CTNNB1 | P35222 | 1/20 | 0.36 |
| ▸ | CES2 | O00748 | 1/20 | 0.36 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.36 |
| ▸ | KCNN4 | O15554 | 1/20 | 0.35 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.35 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL251616 | 0.95 | CES1 (0.50) | CES1SRCALDH1A1POLBNPSR1 | |
| Ether SCHEMBL11039163 | 0.88 | CES1 (0.54) | CES1SRCALDH1A1POLBNPSR1 | |
| Ether SCHEMBL5403863 | 0.83 | CES1 (0.47) | CES1SRCALDH1A1POLBNPSR1 | |
| Ether SCHEMBL27636710 | 0.82 | CES1 (0.50) | CES1SRCALDH1A1POLBNPSR1 | |
| Ether SCHEMBL11189868 | 0.82 | CES1 (0.50) | CES1SRCALDH1A1POLBNPSR1 | |
| Ether SCHEMBL5570218 | 0.81 | CES1 (0.49) | CES1SRCALDH1A1POLBNPSR1 | |
| SCHEMBL2819529 | 0.80 | CES1 (0.45) | CES1SRCALDH1A1LMNACYP3A4 | |
| SCHEMBL9192066 | 0.79 | CES1 (0.47) | CES1SRCALDH1A1POLBCYP2D6 | |
| SCHEMBL12003255 | 0.79 | CES1 (0.46) | CES1SRCALDH1A1SMN1; SMN2LMNA | |
| SCHEMBL948686 | 0.78 | CES1 (0.50) | CES1SRCALDH1A1POLBSMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6284431-B1 | APPLICABLE TO PLATE-MAKING PROCESS IN WHICH DIGITIZED IMAGE IS DRAWN WITH AN INFRARED LASER DIRECTLY WITHOUT USING PHOTOTOOL SUCH AS A NEGATIVE FILM | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2001-09-04 | — | — | US | claimed |
| US-7125236-B2 | Replica molding | SHIN - ETSU CHEMICAL CO. LTD. (JP) | 2006-10-24 | — | — | US | disclosed |
| EP-0832726-B1 | Replica molding | SHONAN DESIGN CO LTD (JP) | 2003-05-21 | — | — | EP | disclosed |
| EP-0908778-B1 | Photosensitive element for flexographic printing | ASAHI CHEMICAL IND (JP) | 2002-11-27 | — | — | EP | disclosed |
| US-20020113334-A1 | Replica molding | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2002-08-22 | — | — | US | disclosed |
| EP-0957120-B1 | Process of manufacture of a photo-cast molding | ASAHI CHEMICAL IND (JP) | 2002-04-03 | — | — | EP | disclosed |
| US-6342178-B1 | FILLING MOLD CAVITY WITH PHOTOCURABLE LIQUID; IRRADIATION WITH LIGHT TO CURE; RADIATION TRANSPARENT; HIGH SPEED, SIMPLIFIED; APPLIANCES, AUTOMOBILES | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2002-01-29 | — | — | US | disclosed |
| EP-0819714-B1 | Photosensitive resin composition for photo-cast-molding | ASAHI CHEMICAL IND (JP) | 2001-11-28 | — | — | EP | disclosed |
| US-6284431-B1 | APPLICABLE TO PLATE-MAKING PROCESS IN WHICH DIGITIZED IMAGE IS DRAWN WITH AN INFRARED LASER DIRECTLY WITHOUT USING PHOTOTOOL SUCH AS A NEGATIVE FILM | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2001-09-04 | — | — | US | disclosed |
| US-5990190-A | PHOTOSENSITIVE RESIN COMPOSITION HAVING AN ULTRAVIOLET TRANSMITTANCE OF 0.05-5% MEASURED AT A 1-MM THICKNESS; MAKING A DUPLICATE MODEL BY PRODUCING AN ULTRAVIOLET-TRANSMITTABLE SILICONE RUBBER-MADE MOLD USING A MASTER MODEL; QUICK-SETTING; | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 1999-11-23 | — | — | US | disclosed |
| EP-0957120-A1 | Process of manufacture of a photo-cast molding | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 1999-11-17 | — | — | EP | disclosed |
| EP-0908778-A2 | Photosensitive element for flexographic printing | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 1999-04-14 | — | — | EP | disclosed |
| EP-0832726-A2 | Replica molding | Shonan Design Co., Ltd. (JP) | 1998-04-01 | — | — | EP | disclosed |
| EP-0819714-A1 | Photosensitive resin composition for photo-cast-molding | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 1998-01-21 | — | — | EP | disclosed |