SCHEMBL606356

SCHEMBL606356

C=COC(C)CO

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL608713 0.84
SCHEMBL8946894 0.82 TDP1 (0.31)
SCHEMBL23064154 0.82 TDP1 (0.31)
SCHEMBL14117999 0.82 TDP1 (0.31)
SCHEMBL23064148 0.82 TDP1 (0.31)
SCHEMBL23064137 0.82 TDP1 (0.31)
SCHEMBL23064131 0.82 TDP1 (0.31)
SCHEMBL23064141 0.82 TDP1 (0.31)
SCHEMBL1155663 0.82 TDP1 (0.31)
SCHEMBL3418881 0.80

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 265 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109021167-B Modified carboxymethyl chitosan quaternary ammonium salt scale inhibitor and preparation method thereof 广东顺德良盛水处理科技有限公司 2021-04-30 CN claimed
CN-108865304-B Amide group-containing coal water slurry additive and preparation method thereof 佛山市天亿化工有限公司 2021-04-30 CN claimed
US-20240343844-A1 POLYMER AND PRODUCTION METHOD THEREFOR UNIVERSITY OF FUKUI (JP) 2024-10-17 US disclosed
WO-2024204690-A1 POLYMERIZABLE COMPOSITION, COPOLYMER, METHOD FOR PRODUCING COPOLYMER, AND KIT FOR PRODUCING COPOLYMER 丸善石油化学株式会社 2024-10-03 WO disclosed
WO-2024195796-A1 METHOD FOR PRODUCING BLOCK COPOLYMER 丸善石油化学株式会社 2024-09-26 WO disclosed
EP-4421099-A1 POLYMER AND PRODUCTION METHOD THEREFOR University of Fukui (JP) 2024-08-28 EP disclosed
US-12038557-B2 Anti-reflection film DAICEL CORPORATION (JP) 2024-07-16 US disclosed
WO-2024135086-A1 PHOTOCURABLE COMPOSITION, UNDERCOAT LAYER, LAMINATE AND DISPLAY DEVICE 株式会社ダイセル 2024-06-27 WO disclosed
US-20240210817-A1 RESIN MOLDED ARTICLE PRODUCTION METHOD AND OPTICAL COMPONENT PRODUCTION METHOD DAICEL CORPORATION (JP) 2024-06-27 US disclosed
CN-112912993-B Method for manufacturing semiconductor device 株式会社大赛璐 2024-06-11 CN disclosed
CN-118103413-A Polymer and method for producing same 国立大学法人福井大学 2024-05-28 CN disclosed
EP-0281991-B1 VINYL ETHERS AND FLUORINE-CONTAINING COPOLYMERS PREPARED THEREFROM DAIKIN INDUSTRIES, LIMITED (JP) 1993-07-14 EP disclosed
US-5066747-A Aqueous coating DAIKIN INDUSTRIES, LTD. (JP) 1991-11-19 US disclosed
US-5008327-A Curable fluorine containing copolymer of fluoroolefin and hydroxy vinyl ether KANSAI PAINT CO., LTD. (JP) 1991-04-16 US disclosed
US-4970331-A Vinyl ethers and fluorine-containing copolymers prepared therefrom DAIKIN INDUSTRIES, LTD. (JP) 1990-11-13 US disclosed
US-4952653-A POLYMERIZING A FLUOROOLEFIN, A NEUTRALIZED ACID-CONTAINING, ESTER-CONTAINING VINYL ETHER AND AN ACID-CONTAINING, ESTER-CONTAINING VINYL ETHER; STOICHIOMETRY DAIKIN INDUSTRIES, LTD. (JP) 1990-08-28 US disclosed
EP-0338498-A2 Process for preparing fluorine-containing copolymers DAIKIN INDUSTRIES, LIMITED (JP) 1989-10-25 EP disclosed
EP-0335361-A2 Electrodeposition coating composition KANSAI PAINT CO., LTD. (JP) 1989-10-04 EP disclosed
US-4859755-A Crosslinkable, fluorine-containing copolymers as binders for highly weather-resistant surface coatings HOECHST AKTIENGESELLSCHAFT (DE) 1989-08-22 US disclosed
EP-0281991-A2 Vinyl ethers and fluorine-containing copolymers prepared therefrom DAIKIN INDUSTRIES, LIMITED (JP) 1988-09-14 EP disclosed