⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4082677 | 0.81 | — | — | |
| SCHEMBL2420007 | 0.69 | — | — | |
| SCHEMBL4074039 | 0.69 | — | — | |
| SCHEMBL4074035 | 0.69 | — | — | |
| SCHEMBL20878813 | 0.67 | MEN1 (0.38) | — | |
| SCHEMBL457846 | 0.66 | ALDH1A1 (0.30) | — | |
| SCHEMBL4076745 | 0.62 | — | — | |
| SCHEMBL3953474 | 0.62 | CYP1A2 (0.33) | — | |
| SCHEMBL4074022 | 0.62 | — | — | |
| SCHEMBL1314267 | 0.60 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7026416-B2 | Unsaturated fluorohydrocarbons used as photoresists for lithography, having chemical and heat resistance; transparency to excimer lasers | ASAHI GLASS COMPANY, LIMITED (JP) | 2006-04-11 | — | — | US | disclosed |
| EP-1580600-A1 | RESIST COMPOSITION | ASAHI GLASS COMPANY LTD. (JP) | 2005-09-28 | — | — | EP | disclosed |
| US-20050209409-A1 | Fluoropolymer | ASAHI GLASS COMPANY LIMITED (JP) | 2005-09-22 | — | — | US | disclosed |
| US-20050202345-A1 | Resist composition | ASAHI GLASS COMPANY LIMITED (JP) | 2005-09-15 | — | — | US | disclosed |
| EP-1559729-A1 | FLUOROPOLYMER | ASAHI GLASS COMPANY LTD. (JP) | 2005-08-03 | — | — | EP | disclosed |