SCHEMBL60659

SCHEMBL60659

FC(F)(F)C[Si](CC(F)(F)F)CC(F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL166134 0.53
Norflurane SCHEMBL11036325 0.53
Norflurane SCHEMBL9499 0.53
Norflurane SCHEMBL5466910 0.53
SCHEMBL25287 0.53
SCHEMBL442671 0.53
Norflurane SCHEMBL1173735 0.53
SCHEMBL23804657 0.50
SCHEMBL2967007 0.50
Norflurane SCHEMBL14482028 0.50

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8637602-B2 Stabilization of vinyl ether materials INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2014-01-28 US claimed
US-8168109-B2 Stabilizers for vinyl ether resist formulations for imprint lithography INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2012-05-01 US claimed
US-8128832-B2 Processes and materials for step and flash imprint lithography INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2012-03-06 US claimed
US-20110042862-A1 Stabilizers for Vinyl Ether Resist Formulations for Imprint Lithography INTERNATIONAL BUSINESS CORPORATION (US) 2011-02-24 US claimed
WO-2011020675-A1 STABILIZERS FOR VINYL ETHER RESIST FORMULATIONS FOR IMPRINT LITHOGRAPHY INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2011-02-24 WO claimed
US-20090092767-A1 STABILIZATION OF VINYL ETHER MATERIALS GLOBALFOUNDRIES INC. (KY) 2009-04-09 US claimed
US-7488771-B2 Stabilization of vinyl ether materials INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2009-02-10 US claimed
US-20080169268-A1 PROCESSES AND MATERIALS FOR STEP AND FLASH IMPRINT LITHOGRAPHY GLOBALFOUNDRIES INC. (KY) 2008-07-17 US claimed
US-20070066750-A1 Stabilization of vinyl ether materials GLOBALFOUNDRIES INC. (KY) 2007-03-22 US claimed
US-20070051697-A1 Processes and materials for step and flash imprint lithography GLOBALFOUNDRIES INC. (KY) 2007-03-08 US claimed
US-20060047094-A1 Late transition metal catalysts for olefin polymerization and oligomerization EXXONMOBIL CHEMICAL PATENTS INC. 2006-03-02 US claimed
EP-3780230-B1 ELECTROLYTIC SOLUTION, ELECTROCHEMICAL DEVICE, LITHIUM-ION SECONDARY BATTERY, AND MODULE DAIKIN IND LTD (JP) 2023-06-14 EP disclosed
US-20210384556-A1 ELECTROLYTIC SOLUTION, ELECTROCHEMICAL DEVICE, LITHIUM-ION SECONDARY BATTERY, AND MODULE DAIKIN INDUSTRIES, LTD. (JP) 2021-12-09 US disclosed
EP-3780230-A1 ELECTROLYTIC SOLUTION, ELECTROCHEMICAL DEVICE, LITHIUM-ION SECONDARY BATTERY, AND MODULE DAIKIN INDUSTRIES, LTD. (JP) 2021-02-17 EP disclosed
US-20140110888-A1 STABILIZATION OF VINYL ETHER MATERIALS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2014-04-24 US disclosed
US-20080241418-A1 RELEASE LAYER FOR IMPRINTED PHOTOCATIONIC CURABLE RESINS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2008-10-02 US disclosed
US-7419611-B2 Processes and materials for step and flash imprint lithography INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2008-09-02 US disclosed
US-20080169268-A1 PROCESSES AND MATERIALS FOR STEP AND FLASH IMPRINT LITHOGRAPHY GLOBALFOUNDRIES INC. (KY) 2008-07-17 US disclosed
US-20070066750-A1 Stabilization of vinyl ether materials GLOBALFOUNDRIES INC. (KY) 2007-03-22 US disclosed
US-20070051697-A1 Processes and materials for step and flash imprint lithography GLOBALFOUNDRIES INC. (KY) 2007-03-08 US disclosed