SCHEMBL607409

SCHEMBL607409

CC=C(C)C(=O)OCC(C)CO

nearest known ligand 0.39

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.39
PRKCA P17252 2/20 0.33
FAAH O00519 1/20 0.31
DHCR24 Q15392 1/20 0.30
ALOX15 P16050 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL489031 0.91 TSHR (0.36) TSHRPRKCA
SCHEMBL1560861 0.91 TSHR (0.36) TSHRPRKCAFAAHALOX15
SCHEMBL10605323 0.84 MAPT (0.42) TSHRFAAHDHCR24ALOX15
SCHEMBL10605319 0.84 MAPT (0.42) TSHRFAAHDHCR24ALOX15
SCHEMBL7776918 0.83 PRKCA (0.34) TSHRPRKCA
SCHEMBL28161187 0.82 TSHR (0.35) TSHR
SCHEMBL7779129 0.81 TSHR (0.33) TSHR
SCHEMBL1473218 0.81 TSHR (0.59) TSHRDHCR24ALOX15
SCHEMBL873047 0.81 TSHR (0.59) TSHRDHCR24ALOX15
SCHEMBL873046 0.81 TSHR (0.59) TSHRDHCR24ALOX15

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 140 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11330721-B2 Resin film, and laminated film including base material film, resin film formed on base material film, and protective film attached to resin film SHOWA DENKO MATERIALS CO., LTD (JP) 2022-05-10 US claimed
CN-113088239-A Ultraviolet light chain initiated self-reaction low-viscosity high-thickness full-curing glue 烟台大学 2021-07-09 CN claimed
US-20200253059-A1 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREFOR, AND RESIN COMPOSITION FOR FORMING FLEXIBLE RESIN LAYER RESONAC CORPORATION (JP) 2020-08-06 US claimed
EP-4383312-A1 FILM FOR TEMPORARY FIXATION, LAYERED PRODUCT FOR TEMPORARY FIXATION, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE Resonac Corporation (JP) 2024-06-12 EP disclosed
EP-4378682-A1 RESIN COMPOSITION, RESIN SHEET, MULTILAYER BODY, SHEET CURED PRODUCT, AND CIRCUIT BOARD MATERIAL Mitsubishi Chemical Corporation (JP) 2024-06-05 EP disclosed
US-20240166858-A1 RESIN COMPOSITION, RESIN SHEET, MULTILAYER BODY, SHEET CURED PRODUCT, AND CIRCUIT BOARD MATERIAL MITSUBISHI CHEMICAL CORPORATION (JP) 2024-05-23 US disclosed
US-20240166794-A1 PHOTOCURABLE COMPOSITION, PHOTOCURABLE FOAM COMPOSITION, URETHANE (METH)ACRYLATE COMPOUND, AND METHOD FOR PRODUCING FOAM SUNSTAR ENGINEERING INC. (JP) 2024-05-23 US disclosed
US-20240150549-A1 RESIN COMPOSITION, CURED PRODUCT, LAMINATE, TRANSPARENT ANTENNA AND MANUFACTURING METHOD THEREFOR, AND IMAGE DISPLAY DEVICE RESONAC CORPORATION (JP) 2024-05-09 US disclosed
US-20240141150-A1 RESIN COMPOSITION, CURED PRODUCT, LAMINATE, TRANSPARENT ANTENNA, MANUFACTURING METHOD THEREFOR, AND IMAGE DISPLAY DEVICE RESONAC CORPORATION (JP) 2024-05-02 US disclosed
EP-3677649-B1 ACTIVE ENERGY RAY-CURABLE COATING COMPOSITION NIPPON PAINT AUTOMOTIVE COATINGS CO LTD (JP) 2024-04-24 EP disclosed
US-20240093059-A1 SEMICONDUCTOR DEVICE MANUFACTURING METHOD, CURABLE RESIN COMPOSITION FOR TEMPORARY FIXATION MATERIAL, FILM FOR TEMPORARY FIXATION MATERIAL, AND LAMINATED FILM FOR TEMPORARY FIXATION MATERIAL RESONAC CORPORATION (JP) 2024-03-21 US disclosed
EP-1808447-A1 Photocurable resin composition and a method for forming a pattern HITACHI CHEMICAL CO., LTD. (JP) 2007-07-18 EP disclosed
US-20070160937-A1 Photocurable resin composition and a method for forming a pattern HITACHI CHEMICAL COMPANY, LTD. (JP) 2007-07-12 US disclosed
US-20070065757-A1 Photo-curable resin composition and a method for forming a pattern using the same HITACHI CHEMICAL CO., LTD. (JP) 2007-03-22 US disclosed
US-20070009834-A1 Photosensitive thermosetting resin composition, and photosensitive cover lay and flexible printed wiring board using the composition ARISAWA MFG. CO., LTD. (JP) 2007-01-11 US disclosed
US-20060041067-A1 Acrylic resin, resin boards, transparent electrode boards for touch panels, touch panels, and processes for production of them MITSUBISHI RAYON CO., LTD. (JP) 2006-02-23 US disclosed
EP-1505090-A1 REACTIVE DILUENT COMPOSITION AND CURABLE RESIN COMPOSITION Nippon Shokubai Co., Ltd. (JP) 2005-02-09 EP disclosed
US-6767980-B2 ACTIVATED ENERGY RAY-CURABLE INK COMPOSITION FOR INK-JET PRINTING; VINYL ETHER GROUP-CONTAINING (METH)ACRYLIC ESTER NIPPON SHOKUBAI CO., LTD. (JP) 2004-07-27 US disclosed
US-6639099-B1 Transesterfication of methacrylic acid esters with 1,n-diols using in situ created zirconium acetylacetone catalyst; high purity materials with reduced level of zirconium impurities ROEHM GMBH & CO. KG (DE) 2003-10-28 US disclosed
US-20030199655-A1 Reactive diluent and curable resin composition NIPPON SHOKUBAI CO., LTD. 2003-10-23 US disclosed