SCHEMBL607741

SCHEMBL607741

OCCOCCOCCOCCOCCOc1ccccc1

nearest known ligand 0.75

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.75
RECQL P46063 1/20 0.75
KCNA3 P22001 1/20 0.56
APP P05067 5/20 0.56
PKM P14618 1/20 0.52
GAA P10253 1/20 0.52
MAPK1 P28482 2/20 0.51
MEN1 O00255 2/20 0.51
KMT2A Q03164 2/20 0.51
USP2 O75604 1/20 0.51
LMNA P02545 1/20 0.51
CYP3A4 P08684 1/20 0.51
CASP1 P29466 1/20 0.51
SMN1; SMN2 Q16637 1/20 0.51
SLCO1B3 Q9NPD5 1/20 0.51
SLCO1B1 Q9Y6L6 1/20 0.51
TAAR1 Q96RJ0 1/20 0.50
L3MBTL1 Q9Y468 1/20 0.49
PARP10 Q53GL7 1/20 0.48
KDM4E B2RXH2 1/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12360570 1.00 ALDH1A1 (0.75) ALDH1A1RECQLKCNA3APPPKM
SCHEMBL12360577 1.00 ALDH1A1 (0.75) ALDH1A1RECQLKCNA3APPPKM
SCHEMBL3705122 1.00 ALDH1A1 (0.75) ALDH1A1RECQLKCNA3APPPKM
SCHEMBL5067164 1.00 ALDH1A1 (0.75) ALDH1A1RECQLKCNA3APPPKM
SCHEMBL9063451 1.00 ALDH1A1 (0.75) ALDH1A1RECQLKCNA3APPPKM
SCHEMBL224480 1.00 ALDH1A1 (0.75) ALDH1A1RECQLKCNA3APPPKM
SCHEMBL608467 1.00 ALDH1A1 (0.75) ALDH1A1RECQLKCNA3APPPKM
SCHEMBL12360574 1.00 ALDH1A1 (0.75) ALDH1A1RECQLKCNA3APPPKM
SCHEMBL21773362 1.00 ALDH1A1 (0.75) ALDH1A1RECQLKCNA3APPPKM
SCHEMBL11985989 1.00 ALDH1A1 (0.75) ALDH1A1RECQLKCNA3APPPKM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 58 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5279760-A Blend of solvent and surfactant TOHOKU ELECTRIC POWER CO., INC. (JP) 1994-01-18 US claimed
US-3959321-A PHOSPHATE ANTIOXIDANT KRAFTCO CORPORATION (US) 1976-05-25 US claimed
US-12036209-B2 Compounds and methods for the targeted degradation of Interleukin-1 receptor-associated kinase 4 polypeptides ARVINAS OPERATIONS, INC. (US) 2024-07-16 US disclosed
US-11857519-B2 Compounds and methods for the targeted degradation of enhancer of zeste homolog 2 polypeptide ARVINAS OPERATIONS, INC. (US) 2024-01-02 US disclosed
US-20220402907-A1 MODULATORS OF PROTEOLYSIS AND ASSOCIATED METHODS OF USE YALE UNIVERSITY 2022-12-22 US disclosed
US-11191741-B2 Compounds and methods for the targeted degradation of enhancer of zeste homolog 2 polypeptide ARVINAS OPERATIONS, INC. (US) 2021-12-07 US disclosed
CN-108431194-B Cleaning agent composition for soldering flux 花王株式会社 2021-02-02 CN disclosed
US-20180177750-A1 COMPOUNDS AND METHODS FOR THE TARGETED DEGRADATION OF ENHANCER OF ZESTE HOMOLOG 2 POLYPEPTIDE ARVINAS OPERATIONS, INC. 2018-06-28 US disclosed
EP-2925738-B1 CARBOXY ESTER KETALS, METHODS OF MANUFACTURE, AND USES THEREOF GFBIOCHEMICALS LTD (MT) 2018-01-10 EP disclosed
US-9458414-B2 Cleaning, surfactant, and personal care compositions GFBIOCHEMICALS LIMITED (MT) 2016-10-04 US disclosed
US-9186878-B2 Process for making lithographic printing plate FUJIFILM CORPORATION (JP) 2015-11-17 US disclosed
EP-0967523-B1 Photosensitive resin composition, method for producing photosensitive resin compsition, and printing plate material TORAY INDUSTRIES (JP) 2003-03-19 EP disclosed
US-20020144718-A1 Water-based paint-removing solution HENKEL KOMMANDITGESELLSCHAFT AUF AKTIEN (DE) 2002-10-10 US disclosed
WO-2002053802-A1 WATER-BASED PAINT-REMOVING SOLUTION HENKEL KOMMANDITGESELLSCHAFT AUF AKTIEN (DE) 2002-07-11 WO disclosed
EP-0967523-A1 Photosensitive resin composition, method for producing photosensitive resin compsition, and printing plate material TORAY INDUSTRIES, INC. (JP) 1999-12-29 EP disclosed
EP-0656817-A1 PROCESS FOR DECONTAMINATING SOLID MATERIALS CONTAMINATED WITH ORGANIC POLLUTANTS FORSCHUNGSZENTRUM JÜLICH GMBH (DE) 1995-06-14 EP disclosed
WO-1994004289-A1 PROCESS AND PLANT FOR DECONTAMINATING SOLID MATERIALS CONTAMINATED WITH ORGANIC POLLUTANTS Forschungszentrum Jülich GmbH (DE) 1994-03-03 WO disclosed
US-5279760-A Blend of solvent and surfactant TOHOKU ELECTRIC POWER CO., INC. (JP) 1994-01-18 US disclosed
US-4110285-A Process for the preparation of stable aqueous emulsions of addition polymers and copolymers SYNRES INTERNATIONAL B.V. (NL) 1978-08-29 US disclosed
US-3959321-A PHOSPHATE ANTIOXIDANT KRAFTCO CORPORATION (US) 1976-05-25 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11191741-B2 Compounds and methods for the targeted degradation of enhancer of zeste homolog 2 polypeptide CRBN, MDM2, VHL ALDH1A1 3688/4885RECQL 1851/4885KCNA3 4718/4885
US-12036209-B2 Compounds and methods for the targeted degradation of Interleukin-1 receptor-associated kinase 4 polypeptides IRAK1, IRAK4, IRAK2 ALDH1A1 2211/4885RECQL 1679/4885KCNA3 4796/4885
US-20220402907-A1 MODULATORS OF PROTEOLYSIS AND ASSOCIATED METHODS OF USE MDM2, CRBN, VHL ALDH1A1 2958/4885RECQL 1008/4885KCNA3 4663/4885
US-11857519-B2 Compounds and methods for the targeted degradation of enhancer of zeste homolog 2 polypeptide CRBN, MDM2, VHL ALDH1A1 3688/4885RECQL 1851/4885KCNA3 4718/4885
US-20180177750-A1 COMPOUNDS AND METHODS FOR THE TARGETED DEGRADATION OF ENHANCER OF ZESTE HOMOLOG 2 POLYPEPTIDE CRBN, MDM2, VHL ALDH1A1 3688/4885RECQL 1851/4885KCNA3 4718/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.