SCHEMBL6077608

SCHEMBL6077608

OC[C@@H](O)[C@@H](O)[C@H](O)[C@H](O)[C@H](O)[C@H](O)CO

nearest known ligand 1.00 ✓ in ChEMBL — recovers established targets

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 2/20 1.00
LMNA P02545 3/20 0.92
L3MBTL1 Q9Y468 1/20 0.92
KDM4E B2RXH2 2/20 0.55
PDE4A P27815 1/20 0.55
USP2 O75604 1/20 0.50
SLCO1B1 Q9Y6L6 1/20 0.50
ALDH1A1 P00352 2/20 0.41
MGAM O43451 4/20 0.39
MAPT P10636 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Perseitol SCHEMBL6078816 1.00 TDP1 (1.00) TDP1LMNAL3MBTL1KDM4EPDE4A
Perseitol SCHEMBL6078811 1.00 TDP1 (1.00) TDP1LMNAL3MBTL1KDM4EPDE4A
Perseitol SCHEMBL11799710 1.00 TDP1 (1.00) TDP1LMNAL3MBTL1KDM4EPDE4A
Perseitol SCHEMBL9231331 1.00 TDP1 (1.00) TDP1LMNAL3MBTL1KDM4EPDE4A
SCHEMBL20838342 1.00 TDP1 (1.00) TDP1LMNAL3MBTL1KDM4EPDE4A
Perseitol SCHEMBL23832483 1.00 TDP1 (1.00) TDP1LMNAL3MBTL1KDM4EPDE4A
SCHEMBL532838 1.00 TDP1 (1.00) TDP1LMNAL3MBTL1KDM4EPDE4A
Perseitol SCHEMBL20567548 1.00 TDP1 (1.00) TDP1LMNAL3MBTL1KDM4EPDE4A
SCHEMBL22283330 1.00 TDP1 (1.00) TDP1LMNAL3MBTL1KDM4EPDE4A
SCHEMBL12344326 1.00 TDP1 (1.00) TDP1LMNAL3MBTL1KDM4EPDE4A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12637588-B2 Method for producing inorganic particle-containing slurry and zirconia particle-containing slurry FUJIMI INCORPORATED (JP) 2026-05-26 US disclosed
US-12606718-B2 Polishing composition, polishing method, and method of manufacturing semiconductor substrate FUJIMI INCORPORATED (JP) 2026-04-21 US disclosed
US-12398294-B2 Polishing composition, polishing method, and method of manufacturing semiconductor substrate FUJIMI INCORPORATED (JP) 2025-08-26 US disclosed
US-20230312981-A1 METHOD FOR PRODUCING INORGANIC PARTICLE-CONTAINING SLURRY AND ZIRCONIA PARTICLE-CONTAINING SLURRY FUJIMI INCORPORATED (JP) 2023-10-05 US disclosed
US-20230312980-A1 POLISHING COMPOSITION, POLISHING METHOD, AND METHOD OF MANUFACTURING SEMICONDUCTOR SUBSTRATE FUJIMI INCORPORATED (JP) 2023-10-05 US disclosed
US-20230287243-A1 POLISHING COMPOSITION, POLISHING METHOD, AND METHOD OF MANUFACTURING SEMICONDUCTOR SUBSTRATE FUJIMI INCORPORATED (JP) 2023-09-14 US disclosed
CN-116731673-A Polishing composition, polishing method, and method for producing semiconductor substrate 福吉米株式会社 2023-09-12 CN disclosed
US-11749531-B2 Polishing method, and polishing composition and method for producing the same FUJIMI INCORPORATED (JP) 2023-09-05 US disclosed
US-20220415669-A1 POLISHING METHOD, AND POLISHING COMPOSITION AND METHOD FOR PRODUCING THE SAME FUJIMI INCORPORATED (JP) 2022-12-29 US disclosed
US-6986793-B2 Method for making bleached crosslinked cellulosic fibers with high color and brightness WEYERHAEUSER COMPANY (US) 2006-01-17 US disclosed
US-20050223501-A1 METHOD FOR MAKING BLEACHED CROSSLINKED CELLULOSIC FIBERS WITH HIGH COLOR AND BRIGHTNESS WEYERHAEUSER COMPANY 2005-10-13 US disclosed
US-20050217812-A1 Bleached crosslinked cellulosic fibers with high color and brightness WEYERHAEUSER COMPANY 2005-10-06 US disclosed
US-20050148966-A1 Absorbent products incorporating individualized intrafiber crosslinked cellulosic fibers with improved brightness and color WEYERHAEUSER COMPANY 2005-07-07 US disclosed
US-20050145350-A1 Individualized intrafiber crosslinked cellulosic fibers with improved brightness and color WEYERHAEUSER COMPANY 2005-07-07 US disclosed
US-20050143571-A1 Method for forming individualized intrafiber crosslinked cellulosic fibers with improved brightness and color WEYERHAEUSER COMPANY 2005-06-30 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12637588-B2 Method for producing inorganic particle-containing slurry and zirconia particle-containing slurry ZAP70, NPM1, ACP1 TDP1 2921/4885LMNA 2296/4885L3MBTL1 4602/4885
US-12606718-B2 Polishing composition, polishing method, and method of manufacturing semiconductor substrate PIEZO1, ZP1, ZAP70 TDP1 1828/4885LMNA 2509/4885L3MBTL1 3105/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.