SCHEMBL608445

SCHEMBL608445

CCONC(=O)OCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8522930 0.85
SCHEMBL541144 0.83 GAA (0.42)
SCHEMBL7590088 0.81 GAA (0.52)
SCHEMBL27633101 0.81 CYP1A2 (0.42)
SCHEMBL2762290 0.81 ACHE (0.41)
SCHEMBL10773332 0.81 EPHX1 (0.44)
Hydrochloric Acid SCHEMBL10556812 0.81 GAA (0.41)
SCHEMBL6203001 0.81
SCHEMBL539517 0.81 GAA (0.50)
SCHEMBL7064589 0.81 GAA (0.50)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 69 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118466118-B Photosensitive dry film resist, photosensitive dry film and application 湖南初源新材料股份有限公司 2024-10-29 CN claimed
CN-118466118-A Photosensitive dry film resist, photosensitive dry film and application 湖南初源新材料股份有限公司 2024-08-09 CN claimed
CN-112898844-A Colored water-based acrylic paint and preparation method thereof 山东华诚高科胶粘剂有限公司 2021-06-04 CN claimed
US-20250320432-A1 COMPOSITIONS AND METHOD FOR FLOOR CLEANING OR RESTORATION ECOLAB USA INC (US) 2025-10-16 US disclosed
EP-4211216-B1 CLEANING COMPOSITIONS RHODIA BRASIL S A (BR) 2025-07-23 EP disclosed
US-12275922-B2 Compositions and method for floor cleaning or restoration ECOLAB USA INC. (US) 2025-04-15 US disclosed
CN-118466118-B Photosensitive dry film resist, photosensitive dry film and application 湖南初源新材料股份有限公司 2024-10-29 CN disclosed
CN-118696652-A Method for seed coating 盈可泰控股有限责任公司 2024-09-27 CN disclosed
CN-118466118-A Photosensitive dry film resist, photosensitive dry film and application 湖南初源新材料股份有限公司 2024-08-09 CN disclosed
US-20230272306-A1 CLEANING COMPOSITIONS RHODIA BRASIL S.A. (BR) 2023-08-31 US disclosed
EP-4211216-A2 CLEANING COMPOSITIONS Rhodia Brasil S.A. (BR) 2023-07-19 EP disclosed
US-6191083-B1 LIQUID CLEANING COMPOUNDS WITH THICKENERS OF POLYMERS FOR PERSONAL HYGEINE THE PROCTER & GAMBLE COMPANY 2001-02-20 US disclosed
EP-1019471-A1 CLEANSING COMPOSITIONS THE PROCTER & GAMBLE COMPANY (US) 2000-07-19 EP disclosed
EP-1019470-A1 CLEANSING COMPOSITIONS THE PROCTER & GAMBLE COMPANY (US) 2000-07-19 EP disclosed
EP-1019469-A1 CLEANSING COMPOSITIONS THE PROCTER & GAMBLE COMPANY (US) 2000-07-19 EP disclosed
WO-1998000499-A1 CLEANSING COMPOSITIONS THE PROCTER & GAMBLE COMPANY (US) 1998-01-08 WO disclosed
WO-1998000495-A1 CLEANSING COMPOSITIONS THE PROCTER & GAMBLE COMPANY (US) 1998-01-08 WO disclosed
WO-1998000494-A1 CLEANSING COMPOSITIONS THE PROCTER & GAMBLE COMPANY (US) 1998-01-08 WO disclosed
EP-0719780-A1 Organic Phosphoric acid ester derivatives NIHON BAYER AGROCHEM K.K. (JP) 1996-07-03 EP disclosed
US-4914124-A ADMINISTERING NEMATOCIDES BAYER AKTIENGESELLSCHAFT (DE) 1990-04-03 US disclosed