SCHEMBL608863

SCHEMBL608863

CC(N)CNCC(=O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10924286 1.00
SCHEMBL16128281 1.00
Isopropylamine SCHEMBL27578658 0.82 GABRP (0.50)
SCHEMBL11111001 0.82 GABRP (0.52)
SCHEMBL5160597 0.81
SCHEMBL4945779 0.80 GABRP (0.40)
SCHEMBL164110 0.80
SCHEMBL1407281 0.80
SCHEMBL8197521 0.80
SCHEMBL21474506 0.80 GABRP (0.36)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 98 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3077129-B1 CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES FUJIFILM ELECTRONIC MAT USA INC (US) 2020-11-11 EP claimed
CN-105849245-B Cleaning formulation for removing residues on surfaces 富士胶片电子材料美国有限公司 2020-03-13 CN claimed
EP-3060642-B1 CLEANING FORMULATIONS FOR REMOVING RESIDUES ON SURFACES FUJIFILM ELECTRONIC MAT USA INC (US) 2019-11-06 EP claimed
CN-105873691-B Cleaning formulation for removing residues on surfaces 富士胶片电子材料美国有限公司 2018-04-20 CN claimed
US-9834746-B2 Cleaning formulations for removing residues on surfaces FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2017-12-05 US claimed
US-9562211-B2 Cleaning formulation for removing residues on surfaces FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2017-02-07 US claimed
EP-3077129-A1 CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES FujiFilm Electronic Materials USA, Inc. (US) 2016-10-12 EP claimed
EP-3060642-A1 CLEANING FORMULATIONS FOR REMOVING RESIDUES ON SURFACES FujiFilm Electronic Materials USA, Inc. (US) 2016-08-31 EP claimed
CN-105873691-A Cleaning formulation for removing residues on surfaces 富士胶片电子材料美国有限公司 2016-08-17 CN claimed
CN-105849245-A Cleaning formulations for removing residues on surfaces 富士胶片电子材料美国有限公司 2016-08-10 CN claimed
WO-2015084921-A1 CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2015-06-11 WO claimed
US-20150159124-A1 CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2015-06-11 US claimed
WO-2015060954-A1 CLEANING FORMULATIONS FOR REMOVING RESIDUES ON SURFACES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2015-04-30 WO claimed
US-20150111804-A1 CLEANING FORMULATIONS FOR REMOVING RESIDUES ON SURFACES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2015-04-23 US claimed
CN-115989314-B Treatment liquid and method for treating substrate 富士胶片株式会社 2025-04-15 CN disclosed
US-12275921-B2 Treatment liquid and substrate treatment method FUJIFILM CORPORATION (JP) 2025-04-15 US disclosed
US-20240400949-A1 COMPOSITION, COMPOUND, RESIN, SUBSTRATE TREATMENT METHOD, AND MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE FUJIFILM CORPORATION (JP) 2024-12-05 US disclosed
EP-0091594-B1 AMINOCARBOXYLIC ACID DERIVATIVES Sanraku Incorporated (JP) 1986-01-22 EP disclosed
US-4528397-A Aminocarboxylic acid derivatives SANRAKU-OCEAN CO., LTD. (JP) 1985-07-09 US disclosed
EP-0091594-A1 Aminocarboxylic acid derivatives Sanraku Incorporated (JP) 1983-10-19 EP disclosed