SCHEMBL6131203

SCHEMBL6131203

OC(CCl)COCC(COCC(O)CCl)(COCC(O)CCl)COCC(O)CCl

nearest known ligand 0.36

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
CA1 P00915 2/20 0.36
CA2 P00918 2/20 0.36
CA9 Q16790 1/20 0.36
AR P10275 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26708175 0.89 HSD17B10 (0.32) CA1CA2CA9AR
SCHEMBL8958119 0.81 AR (0.38) CA1CA2CA9AR
SCHEMBL18578829 0.81 HTT (0.37) CA1CA2CA9AR
SCHEMBL16854501 0.81 HTT (0.37) CA1CA2CA9AR
SCHEMBL202567 0.81 CA1 (0.45) CA1CA2CA9AR
SCHEMBL811510 0.78 CA1 (0.43) CA1CA2CA9AR
SCHEMBL19951506 0.78 CA1 (0.43) CA1CA2CA9AR
SCHEMBL7123980 0.77 USP2 (0.43) AR
SCHEMBL7535158 0.76 CA1 (0.41) CA1CA2CA9AR
SCHEMBL18594844 0.75 HTT (0.45) CA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6881529-B2 Positive photoresist transfer material and method for processing surface of substrate using the transfer material FUJI PHOTO FILM CO., LTD. (JP) 2005-04-19 US disclosed