Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | AR | P10275 | 3/20 | 0.57 |
| ▸ | ESR1 | P03372 | 8/20 | 0.53 |
| ▸ | ESR2 | Q92731 | 8/20 | 0.53 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.53 |
| ▸ | HPGD | P15428 | 1/20 | 0.53 |
| ▸ | TSHR | P16473 | 1/20 | 0.53 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.53 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.53 |
| ▸ | HTR6 | P50406 | 1/20 | 0.53 |
| ▸ | ESRRG | P62508 | 1/20 | 0.53 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.53 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.53 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.47 |
| ▸ | HTT | P42858 | 1/20 | 0.44 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.44 |
| ▸ | LMNA | P02545 | 1/20 | 0.39 |
| ▸ | TYR | P14679 | 1/20 | 0.39 |
| ▸ | SHBG | P04278 | 1/20 | 0.38 |
| ▸ | ADRB2 | P07550 | 1/20 | 0.36 |
| ▸ | ADRB1 | P08588 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13189123 | 0.86 | AR (0.78) | ARESR1ESR2CYP3A4HPGD | |
| Hydroquinone SCHEMBL6350929 | 0.86 | AR (0.38) | ARCYP3A4HPGDTSHRSLC6A2 | |
| Bisphenol A SCHEMBL28607999 | 0.84 | ALDH1A1 (0.48) | ARESR1ESR2CYP3A4HPGD | |
| Bisphenol A SCHEMBL2483853 | 0.82 | ESR1 (0.61) | ARESR1ESR2CYP3A4HPGD | |
| Bisphenol A SCHEMBL7267149 | 0.81 | ESR1 (0.59) | ARESR1ESR2CYP3A4HPGD | |
| SCHEMBL6353330 | 0.80 | ESR1 (0.44) | ARESR1ESR2CYP3A4SLC6A2 | |
| Bisphenol A SCHEMBL6131229 | 0.78 | ESR1 (0.47) | ARESR1ESR2CYP3A4HPGD | |
| SCHEMBL12515785 | 0.78 | AR (0.88) | ARHPGDTSHRHSD17B10ALDH1A1 | |
| SCHEMBL6131219 | 0.78 | AR (0.88) | ARHPGDTSHRHSD17B10ALDH1A1 | |
| Bisphenol A SCHEMBL29129589 | 0.78 | ESR1 (0.80) | ARESR1ESR2CYP3A4HPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 71 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113295794-A | Rapid screening method for content of multiple types of nonvolatile risk substances in white spirit | 贵州茅台酒股份有限公司 | 2021-08-24 | — | — | CN | claimed |
| US-11977333-B2 | Semiconductor devices and methods of manufacturing | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2024-05-07 | — | — | US | disclosed |
| US-20240079235-A1 | SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING | TAIWAN SEMICONDUCTOR MFG CO LTD (TW) | 2024-03-07 | — | — | US | disclosed |
| US-11842896-B2 | Semiconductor devices and methods of manufacturing | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2023-12-12 | — | — | US | disclosed |
| US-20230251571-A1 | Photoresist and Method of Formation and Use | TAIWAN SEMICONDUCTOR MFG CO LTD (TW) | 2023-08-10 | — | — | US | disclosed |
| US-11650500-B2 | Photoresist and method of formation and use | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2023-05-16 | — | — | US | disclosed |
| US-20230146910-A1 | METHODS AND COMPOSITIONS FOR IMPROVED PATTERNING OF PHOTORESIST | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2023-05-11 | — | — | US | disclosed |
| CN-113295794-B | Rapid screening method for content of multiple types of nonvolatile risk substances in white spirit | 贵州茅台酒股份有限公司 | 2023-03-21 | — | — | CN | disclosed |
| US-20230064162-A1 | Semiconductor Device and Methods of Manufacture | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2023-03-02 | — | — | US | disclosed |
| US-20220392764-A1 | UNDERLAYER OF MULTILAYER STRUCTURE AND METHODS OF USE THEREOF | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2022-12-08 | — | — | US | disclosed |
| US-9017934-B2 | Photoresist defect reduction system and method | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2015-04-28 | — | — | US | disclosed |
| US-20150111384-A1 | Anti-Reflective Layer and Method | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY (TW) | 2015-04-23 | — | — | US | disclosed |
| US-20150056555-A1 | Photoresist and Method of Formation and Use | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2015-02-26 | — | — | US | disclosed |
| US-20140272716-A1 | Photoresist System and Method | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2014-09-18 | — | — | US | disclosed |
| US-20140272724-A1 | Photoresist System and Method | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2014-09-18 | — | — | US | disclosed |
| US-20140273457-A1 | Anti-Reflective Layer and Method | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2014-09-18 | — | — | US | disclosed |
| US-20140273506-A1 | Unlocking Layer and Method | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2014-09-18 | — | — | US | disclosed |
| US-20140255851-A1 | Photoresist Defect Reduction System and Method | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2014-09-11 | — | — | US | disclosed |
| US-6881529-B2 | Positive photoresist transfer material and method for processing surface of substrate using the transfer material | FUJI PHOTO FILM CO., LTD. (JP) | 2005-04-19 | — | — | US | disclosed |
| US-20030087179-A1 | Positive photoresist transfer material and method for processing surface of substrate using the transfer material | FUJI PHOTO FILM CO., LTD. | 2003-05-08 | — | — | US | disclosed |