SCHEMBL6131327

SCHEMBL6131327

C=C(C)C(=O)O/C=C/c1ccccc1C

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 4/20 0.40
▸ TSHR P16473 2/20 0.40
▸ KDM4E B2RXH2 5/20 0.38
▸ LMNA P02545 3/20 0.38
▸ SMN1; SMN2 Q16637 2/20 0.38
▸ GMNN O75496 1/20 0.38
▸ PMP22 Q01453 1/20 0.38
▸ ELANE P08246 1/20 0.36
▸ HPGD P15428 2/20 0.36
▸ RAB9A P51151 5/20 0.36
▸ TP53 P04637 1/20 0.36
▸ CYP1A2 P05177 1/20 0.36
▸ CYP2D6 P10635 1/20 0.36
▸ THPO P40225 1/20 0.36
▸ HIF1A Q16665 1/20 0.36
▸ NR1H2 P55055 1/20 0.36
▸ NR1H3 Q13133 1/20 0.36
▸ GAA P10253 3/20 0.35
▸ TDP1 Q9NUW8 1/20 0.35
▸ APOBEC3A P31941 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3807035 0.83 ALDH1A1 (0.45) ALDH1A1TSHRKDM4ELMNASMN1; SMN2
SCHEMBL15637612 0.83 GSR (0.47) ALDH1A1LMNASMN1; SMN2HPGDRAB9A
SCHEMBL10836142 0.81 CYP1A1 (0.41) KDM4ELMNASMN1; SMN2RAB9ATP53
SCHEMBL14775079 0.80 ALDH1A1 (0.45) ALDH1A1TSHRKDM4ELMNASMN1; SMN2
SCHEMBL12586086 0.78 KDM4E (0.40) ALDH1A1TSHRKDM4ELMNASMN1; SMN2
SCHEMBL194943 0.78 GLA (0.48) ALDH1A1LMNASMN1; SMN2ELANECYP1A2
SCHEMBL188344 0.78 GLA (0.48) ALDH1A1LMNASMN1; SMN2ELANECYP1A2
SCHEMBL5550879 0.77 GLA (0.47) ALDH1A1KDM4ELMNASMN1; SMN2ELANE
Methacrylic Acid SCHEMBL20959690 0.75 GLA (0.46) ALDH1A1LMNASMN1; SMN2ELANECYP1A2
Methacrylic Acid SCHEMBL20959691 0.75 GLA (0.46) ALDH1A1LMNASMN1; SMN2ELANECYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6919411-B2 Process for producing polymer compound FUJI PHOTO FILM CO., LTD. (JP) 2005-07-19 — — US disclosed
US-20030215745-A1 Process for producing polymer compound FUJI PHOTO FILM CO., LTD. 2003-11-20 — — US disclosed
EP-1344783-A1 Process for producing polymer compounds by elimination reaction FUJI PHOTO FILM CO., LTD. (JP) 2003-09-17 — — EP disclosed
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