Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6551867 | 0.87 | — | — | |
| SCHEMBL5692930 | 0.82 | — | — | |
| Carbon Monoxide SCHEMBL544386 | 0.67 | TSHR (0.31) | TSHRALDH1A1 | |
| Carbon Monoxide SCHEMBL934412 | 0.67 | — | — | |
| Carbon Monoxide SCHEMBL10766248 | 0.67 | TSHR (0.31) | TSHRALDH1A1 | |
| Allyl Alcohol SCHEMBL7495069 | 0.67 | — | — | |
| Carbon Monoxide SCHEMBL2842408 | 0.67 | TSHR (0.31) | TSHRALDH1A1 | |
| Carbon Monoxide SCHEMBL9016270 | 0.67 | — | — | |
| Carbon Monoxide SCHEMBL2844193 | 0.67 | — | — | |
| Carbon Monoxide SCHEMBL11758956 | 0.64 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6844261-B2 | Method of forming ruthenium and ruthenium oxide films on a semiconductor structure | MICRON TECHNOLOGY, INC. (US) | 2005-01-18 | — | — | US | disclosed |
| US-6840988-B2 | Solvated ruthenium precursors for direct liquid injection of ruthenium and ruthenium oxide | MICRON TECHNOLOGY, INC. (US) | 2005-01-11 | — | — | US | disclosed |
| US-20030154880-A1 | Solvated ruthenium precursors for direct liquid injection of ruthenium and ruthenium oxide | CONVERSANT INTELLECTUAL PROPERTY MANAGEMENT INC. (CA) | 2003-08-21 | — | — | US | disclosed |
| US-20030092262-A1 | Solvated ruthenium precursors for direct liquid injection of ruthenium and ruthenium oxide | CONVERSANT INTELLECTUAL PROPERTY MANAGEMENT INC. (CA) | 2003-05-15 | — | — | US | disclosed |
| US-6541067-B1 | Solvated ruthenium precursors for direct liquid injection of ruthenium and ruthenium oxide and method of using same | MICRON TECHNOLOGY, INC. | 2003-04-01 | — | — | US | disclosed |
| US-6517616-B2 | Solvated ruthenium precursors for direct liquid injection of ruthenium and ruthenium oxide | MICRON TECHNOLOGY, INC. | 2003-02-11 | — | — | US | disclosed |
| US-20020053299-A1 | Solvated ruthenium precursors for direct liquid injection of ruthenium and ruthenium oxide | CONVERSANT INTELLECTUAL PROPERTY MANAGEMENT INC. (CA) | 2002-05-09 | — | — | US | disclosed |
| US-6063705-A | Precursor chemistries for chemical vapor deposition of ruthenium and ruthenium oxide | MICRON TECHNOLOGY, INC. (US) | 2000-05-16 | — | — | US | disclosed |
| WO-2000012776-A1 | PRECURSOR CHEMISTRIES FOR CHEMICAL VAPOR DEPOSITION OF RUTHENIUM AND RUTHENIUM OXIDE | MICRON TECHNOLOGY, INC. (US) | 2000-03-09 | — | — | WO | disclosed |