SCHEMBL6135760

SCHEMBL6135760

C[Si](C)(C)O.C[Si](C)(C)O.C[Si](C)(C)O.C[Si](C)(C)O.[Hf]

nearest known ligand 0.30

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15342 0.93
SCHEMBL27481422 0.93 ALDH1A1 (0.33) ALDH1A1
SCHEMBL6135207 0.86 ALDH1A1 (0.30) ALDH1A1
Ammonia Solution, Strong SCHEMBL7066020 0.86
SCHEMBL423855 0.86
SCHEMBL8853785 0.86 ALDH1A1 (0.30) ALDH1A1
SCHEMBL3432651 0.86
SCHEMBL504312 0.86
SCHEMBL22973418 0.86
SCHEMBL20513496 0.86

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1230419-A4 COMPOSITION AND METHOD FOR CVD DEPOSITION OF Zr/Hf SILICATE FILMS ADVANCED TECH MATERIALS (US) 2005-04-20 EP claimed
EP-1230419-A1 COMPOSITION AND METHOD FOR CVD DEPOSITION OF Zr/Hf SILICATE FILMS ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2002-08-14 EP claimed
US-6399208-B1 VAPOR DEPOSITION THIN FILM ZIRCONIUM HAFNIUM SILICATE BARRIERS ADVANCED TECHNOLOGY MATERIALS INC. 2002-06-04 US claimed
WO-2001025502-A1 COMPOSITION AND METHOD FOR CVD DEPOSITION OF Zr/Hf SILICATE FILMS ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2001-04-12 WO claimed