⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL998763 | 0.64 | — | — | |
| SCHEMBL951944 | 0.63 | — | — | |
| SCHEMBL10933497 | 0.63 | — | — | |
| SCHEMBL9131788 | 0.63 | — | — | |
| SCHEMBL1915524 | 0.61 | — | — | |
| SCHEMBL8144229 | 0.61 | — | — | |
| SCHEMBL3389211 | 0.60 | — | — | |
| SCHEMBL9506482 | 0.60 | — | — | |
| SCHEMBL4890374 | 0.60 | — | — | |
| SCHEMBL5694387 | 0.60 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1099691-B1 | N-Sulfonyloxyimide compound and radiation-sensitive resin composition using the same | JSR CORP (JP) | 2005-03-02 | — | — | EP | disclosed |
| US-6517992-B1 | N-sulfonyloxyimide compound and radiation-sensitive resin composition using the same | JSR CORPORATION (JP) | 2003-02-11 | — | — | US | disclosed |
| US-6506537-B2 | Photopolymerization | JSR CORPORATION (JP) | 2003-01-14 | — | — | US | disclosed |
| US-20020012872-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-01-31 | — | — | US | disclosed |
| EP-1164433-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-19 | — | — | EP | disclosed |
| EP-1099691-A1 | N-Sulfonyloxyimide compound and radiation-sensitive resin composition using the same | JSR Corporation (JP) | 2001-05-16 | — | — | EP | disclosed |