SCHEMBL6138101

SCHEMBL6138101

Nc1ccc2c(c1)-c1cc(N)ccc1C2(c1ccccc1N)c1ccccc1N

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PDK2 Q15119 2/20 0.49
SMN1; SMN2 Q16637 5/20 0.48
MEN1 O00255 4/20 0.48
KMT2A Q03164 4/20 0.48
LMNA P02545 3/20 0.48
KDM4E B2RXH2 3/20 0.48
MAPT P10636 3/20 0.48
OPRK1 P41145 1/20 0.48
ALDH1A1 P00352 6/20 0.41
CYP3A4 P08684 6/20 0.41
NPC1 O15118 3/20 0.41
RAB9A P51151 3/20 0.41
TDP1 Q9NUW8 2/20 0.41
TSHR P16473 2/20 0.41
TP53 P04637 1/20 0.41
MAPK1 P28482 1/20 0.41
PTPRC P08575 2/20 0.39
HPGD P15428 2/20 0.39
POLB P06746 2/20 0.39
APAF1 O14727 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30041419 0.87 SMN1; SMN2 (0.63) PDK2SMN1; SMN2MEN1KMT2ALMNA
SCHEMBL17055655 0.87 SMN1; SMN2 (0.63) PDK2SMN1; SMN2MEN1KMT2ALMNA
SCHEMBL19054970 0.87 SMN1; SMN2 (0.63) PDK2SMN1; SMN2MEN1KMT2ALMNA
SCHEMBL12130589 0.87 SMN1; SMN2 (0.63) PDK2SMN1; SMN2MEN1KMT2ALMNA
SCHEMBL6138398 0.86 PDK2 (0.50) PDK2SMN1; SMN2MEN1KMT2ALMNA
SCHEMBL31619079 0.84 PDK2 (0.45) PDK2SMN1; SMN2MEN1KMT2ALMNA
SCHEMBL29580288 0.82 KMT2A (0.56) PDK2SMN1; SMN2MEN1KMT2ALMNA
SCHEMBL109214 0.82 KMT2A (0.56) PDK2SMN1; SMN2MEN1KMT2ALMNA
SCHEMBL16384351 0.82 SMN1; SMN2 (0.57) PDK2SMN1; SMN2MEN1KMT2ALMNA
SCHEMBL20821450 0.82 SMN1; SMN2 (0.57) PDK2SMN1; SMN2MEN1KMT2ALMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1117102-B1 Method of manufacturing material for forming insulating film JSR CORP (JP) 2005-08-10 EP disclosed
US-6642352-B2 Providing a silicon inorganic polymer compound or polyarylenes or polyphenylene ether organic polymer compound, treating the polymeric compound with a zeta-potential producing filter material, and producing curable polymer compound JSR CORPORATION (JP) 2003-11-04 US disclosed
US-20010009936-A1 Method of manufacturing material for forming insulating film JSR CORPORATION (JP) 2001-07-26 US disclosed
EP-1117102-A2 Method of manufacturing material for forming insulating film JSR Corporation (JP) 2001-07-18 EP disclosed