SCHEMBL6138233

SCHEMBL6138233

COC1=CC=C(OC)C1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13839056 0.79 CA1 (0.35)
SCHEMBL12351069 0.74
SCHEMBL12351064 0.74
SCHEMBL5687562 0.73 CYP3A4 (0.33)
SCHEMBL9231706 0.72 CA1 (0.33)
SCHEMBL7220719 0.70 CYP3A4 (0.32)
SCHEMBL3942932 0.69 CA1 (0.31)
SCHEMBL9599429 0.69
SCHEMBL32670669 0.68
SCHEMBL20233873 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023005263-A1 RESIN COMPOSITION, RESIN FILM, AND DISPLAY DEVICE 吉林奥来德光电材料股份有限公司 2023-02-02 WO disclosed
EP-1099691-B1 N-Sulfonyloxyimide compound and radiation-sensitive resin composition using the same JSR CORP (JP) 2005-03-02 EP disclosed
US-6517992-B1 N-sulfonyloxyimide compound and radiation-sensitive resin composition using the same JSR CORPORATION (JP) 2003-02-11 US disclosed
EP-1099691-A1 N-Sulfonyloxyimide compound and radiation-sensitive resin composition using the same JSR Corporation (JP) 2001-05-16 EP disclosed