SCHEMBL6138263

SCHEMBL6138263

CON(OC)C(N)=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28216682 0.79
SCHEMBL27616750 0.75
SCHEMBL8893309 0.73
SCHEMBL17979634 0.72 ALDH1A1 (0.35)
SCHEMBL218665 0.71
SCHEMBL1137460 0.69
Methoxymethane SCHEMBL1883896 0.69
SCHEMBL9101342 0.69
SCHEMBL5079222 0.67 F2 (0.30)
Formaldehyde SCHEMBL10782731 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 61 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5407777-A Diazo-type recording material comprising a 1-phenyl-3-pyrazolidone(phenidone) as an anti-oxidant FUJI PHOTO FILM CO., LTD. (JP) 1995-04-18 US claimed
US-4486527-A HEAT-FUSIBLE COLOR ASSISTANT RICOH COMPANY, LTD. (JP) 1984-12-04 US claimed
US-10415011-B2 Adherend recovery method, adherend recovery apparatus, gas-generating film and resin composition JSR CORPORATION (JP) 2019-09-17 US disclosed
EP-3040411-B1 ADHEREND RECOVERY METHOD AND ADHEREND RECOVERY DEVICE JSR CORP (JP) 2019-07-03 EP disclosed
CN-109415467-A PHOTOSENSITIVE COMPOSITION, METHOD FOR PRODUCING POLYMER, METHOD FOR PRODUCING PHOTOSENSITIVE COMPOSITION, AND METHOD FOR PRODUCING LAMINATE AGC株式会社 2019-03-01 CN disclosed
CN-108351591-A Fluorescence analysis biochip photosensitive composite, the manufacturing method of fluorescence analysis biochip and fluorescence analysis biochip 旭硝子株式会社 2018-07-31 CN disclosed
EP-3040411-A1 ADHEREND RECOVERY METHOD, ADHEREND RECOVERY DEVICE, GAS GENERATION MEMBRANE, AND RESIN COMPOSITION JSR Corporation (JP) 2016-07-06 EP disclosed
US-20160168532-A1 ADHEREND RECOVERY METHOD, ADHEREND RECOVERY APPARATUS, GAS-GENERATING FILM AND RESIN COMPOSITION JSR CORPORATION (JP) 2016-06-16 US disclosed
EP-1099691-B1 N-Sulfonyloxyimide compound and radiation-sensitive resin composition using the same JSR CORP (JP) 2005-03-02 EP disclosed
US-6517992-B1 N-sulfonyloxyimide compound and radiation-sensitive resin composition using the same JSR CORPORATION (JP) 2003-02-11 US disclosed
US-6506537-B2 Photopolymerization JSR CORPORATION (JP) 2003-01-14 US disclosed
US-4650740-A DIAZONIUM SALT AND COUPLER FUJI PHOTO FILM CO., LTD. (JP) 1987-03-17 US disclosed
US-4644376-A Heat-sensitive recording material FUJI PHOTO FILM CO., LTD. (JP) 1987-02-17 US disclosed
US-4598035-A LEUCO AND DISAZO DYES FUJI PHOTO FILM CO., LTD. (JP) 1986-07-01 US disclosed
EP-0184132-A2 Thermal recording apparatus FUJI PHOTO FILM CO., LTD. (JP) 1986-06-11 EP disclosed
US-4529681-A Microcapsules containing vinyl compound, photoinitiator and color forming compound FUJI PHOTO FILM CO., LTD. (JP) 1985-07-16 US disclosed
US-4497887-A Thermal development type diazo copying material with hydrophobic resin encapsulated coupler particle Ricoh Compay, Ltd. (JP) 1985-02-05 US disclosed
US-4486527-A HEAT-FUSIBLE COLOR ASSISTANT RICOH COMPANY, LTD. (JP) 1984-12-04 US disclosed
US-4467024-A Process for the production of thermo-developable type diazo copying material RICOH CO., LTD. (JP) 1984-08-21 US disclosed
US-4416967-A SUBSTRATE, PRECOAT LAYER OF SILICA AND COPOLYMER OF ACRYLIC, OXY, RICOH CO., LTD. (JP) 1983-11-22 US disclosed