SCHEMBL6138423

SCHEMBL6138423

Nc1cccc(-c2cccc3c2Cc2ccccc2-3)c1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 3/20 0.53
NPC1 O15118 2/20 0.53
RAB9A P51151 2/20 0.53
KDM4E B2RXH2 2/20 0.53
ALDH1A1 P00352 2/20 0.53
LMNA P02545 2/20 0.53
HPGD P15428 2/20 0.53
SMN1; SMN2 Q16637 1/20 0.53
PNMT P11086 1/20 0.49
MAOA P21397 1/20 0.47
MAP4K4 O95819 1/20 0.45
ADORA2A P29274 1/20 0.44
ADORA1 P30542 1/20 0.44
ACHE P22303 2/20 0.42
TDP2 O95551 1/20 0.40
HTR7 P34969 1/20 0.40
HTR2B P41595 1/20 0.40
BRD4 O60885 1/20 0.39
POLB P06746 1/20 0.38
CA1 P00915 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7805131 0.88 NPC1 (0.50) MAPTNPC1RAB9AKDM4EALDH1A1
SCHEMBL30074156 0.87 NPC1 (0.51) MAPTNPC1RAB9AKDM4EALDH1A1
SCHEMBL28282684 0.87 NPC1 (0.51) MAPTNPC1RAB9AKDM4EALDH1A1
SCHEMBL28851607 0.87 PNMT (0.52) MAPTNPC1RAB9AKDM4EALDH1A1
SCHEMBL28888665 0.86 KDM4E (0.50) MAPTNPC1RAB9AKDM4EALDH1A1
SCHEMBL1681656 0.82 NPC1 (0.52) MAPTNPC1RAB9AKDM4EALDH1A1
SCHEMBL7805125 0.81 PNMT (0.47) MAPTNPC1RAB9AKDM4EALDH1A1
Benzidine SCHEMBL28228770 0.81 HSD17B10 (0.50) MAPTNPC1RAB9AKDM4EALDH1A1
Biphenyl SCHEMBL27512224 0.81 HSD17B10 (0.50) MAPTNPC1RAB9AKDM4EALDH1A1
SCHEMBL70992 0.81 PNMT (0.53) NPC1RAB9APNMTADORA2AADORA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113150545-B Polymer film containing nano fullerene and preparation method thereof 北京市科学技术研究院分析测试研究所(北京市理化分析测试中心) 2022-11-15 CN claimed
CN-117120516-A Polyimide, resin composition, polyimide film, and method for producing same 旭化成株式会社 2023-11-24 CN disclosed
CN-116554473-A Thermoplastic polyimide and application thereof in temporary bonding technology 深圳先进电子材料国际创新研究院 2023-08-08 CN disclosed
CN-114683633-A Laminate and method for manufacturing same 律胜科技股份有限公司 2022-07-01 CN disclosed
CN-104662097-B Resin combination, cured film, the manufacturing method of laminate film and semiconductor devices 东丽株式会社 2018-06-05 CN disclosed
CN-106574163-A Adhesive for temporary bonding, adhesive layer, method for manufacturing wafer work piece and semiconductor device using same, rework solvent, polyimide copolymer, polyimide mixed resin, and resin composition 东丽株式会社 2017-04-19 CN disclosed
CN-106029743-A Composition containing polyimide precursor and/or polyimide, and polyimide film 三菱化学株式会社 2016-10-12 CN disclosed
CN-106029744-A POLYIMIDE RESIN, RESIN COMPOSITION USING SAME, AND LAMINATED FILM 东丽株式会社 2016-10-12 CN disclosed
CN-105612600-A Element-processing layered structure, method for manufacturing element-processing layered structure, and method for manufacturing thin element using same TORAY INDUSTRIES 2016-05-25 CN disclosed
CN-103748141-B Polyimide resin, the resin combination using it and laminate film TORAY INDUSTRIES, INC. (JP) 2016-04-20 CN disclosed
CN-100345927-C Adhesive plaster for electronic parts and electronic parts TOMOEGAWA PAPER CO LTD (JP) 2007-10-31 CN disclosed
CN-1954015-A Polyimide resin, multilayer film, multilayer film with metal layer, and semiconductor device TORAY INDUSTRIES (JP) 2007-04-25 CN disclosed
CN-1929994-A Heat-resistant resin laminated film, multilayer film with metal layer including same, and semiconductor device TORAY INDUSTRIES (JP) 2007-03-14 CN disclosed
CN-1721489-A Adhesive plaster for electronic parts and electronic parts TOMOEGAWA PAPER CO LTD (JP) 2006-01-18 CN disclosed
EP-1117102-B1 Method of manufacturing material for forming insulating film JSR CORP (JP) 2005-08-10 EP disclosed
CN-1136252-C Preparation of polyimide and polyamine acid 世韩米克罗尼克斯株式会社 2004-01-28 CN disclosed
CN-1117113-C Preparation of polyimide resin and polyamine acid as adhesive SAEHAN IND CO LTD (KR) 2003-08-06 CN disclosed
CN-1313349-A Preparation of polyimide and polyamine acid SAEHAN IND CO LTD (KR) 2001-09-19 CN disclosed
CN-1313350-A Preparation of polyimide resin and polyamine acid as adhesive SAEHAN IND CO LTD (KR) 2001-09-19 CN disclosed
EP-1117102-A2 Method of manufacturing material for forming insulating film JSR Corporation (JP) 2001-07-18 EP disclosed