SCHEMBL6138599

SCHEMBL6138599

CCCCCCCCCCCCCc1ccc(OCCO)cc1

nearest known ligand 0.82

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.82
LMNA P02545 2/20 0.82
CYP3A4 P08684 2/20 0.82
MEN1 O00255 2/20 0.82
KMT2A Q03164 2/20 0.82
USP2 O75604 1/20 0.82
MAPK1 P28482 1/20 0.82
CASP1 P29466 1/20 0.82
SMN1; SMN2 Q16637 1/20 0.82
SLCO1B3 Q9NPD5 1/20 0.82
SLCO1B1 Q9Y6L6 1/20 0.82
NR5A1 Q13285 1/20 0.56
ESR1 P03372 2/20 0.55
ADRA2A P08913 2/20 0.55
ADORA3 P0DMS8 2/20 0.55
TACR2 P21452 2/20 0.55
SLC6A2 P23975 2/20 0.55
SLC6A4 P31645 2/20 0.55
SLC6A3 Q01959 2/20 0.55
TP53 P04637 2/20 0.55

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6138513 1.00 ALDH1A1 (0.82) ALDH1A1LMNACYP3A4MEN1KMT2A
SCHEMBL6138551 1.00 ALDH1A1 (0.82) ALDH1A1LMNACYP3A4MEN1KMT2A
SCHEMBL6138495 1.00 ALDH1A1 (0.82) ALDH1A1LMNACYP3A4MEN1KMT2A
SCHEMBL6138677 1.00 ALDH1A1 (0.82) ALDH1A1LMNACYP3A4MEN1KMT2A
SCHEMBL6138604 1.00 ALDH1A1 (0.82) ALDH1A1LMNACYP3A4MEN1KMT2A
SCHEMBL6138455 1.00 ALDH1A1 (0.82) ALDH1A1LMNACYP3A4MEN1KMT2A
SCHEMBL6138560 1.00 ALDH1A1 (0.82) ALDH1A1LMNACYP3A4MEN1KMT2A
SCHEMBL6138349 1.00 ALDH1A1 (0.82) ALDH1A1LMNACYP3A4MEN1KMT2A
SCHEMBL6138468 1.00 ALDH1A1 (0.82) ALDH1A1LMNACYP3A4MEN1KMT2A
SCHEMBL6138681 1.00 ALDH1A1 (0.82) ALDH1A1LMNACYP3A4MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1058274-B1 Composition for film formation and material for insulating film formation JSR CORP (JP) 2005-07-27 EP disclosed
US-6376634-B1 ORGANOSILICON POLYMERS JSR CORPORATION (JP) 2002-04-23 US disclosed
EP-1058274-A1 Composition for film formation and material for insulating film formation JSR Corporation (JP) 2000-12-06 EP disclosed