Acrylic Acid

Acrylic Acid

SCHEMBL6139224

C=CC(=O)O.OCC1CCC2OC2C1

nearest known ligand 0.35

Full drug profile on Sugi Atlas →

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.35
TFPI2 P48307 2/20 0.35
KDM4E B2RXH2 1/20 0.35
GMNN O75496 1/20 0.35
PMP22 Q01453 1/20 0.35
TP53 P04637 1/20 0.35
TSHR P16473 1/20 0.35
NFKB1 P19838 1/20 0.35
THPO P40225 1/20 0.35
THRA P10827 1/20 0.31
THRB P10828 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Acrylic Acid SCHEMBL5933918 0.83 LMNA (0.46) LMNATSHRTHRATHRB
SCHEMBL10476712 0.83
SCHEMBL21469749 0.83
SCHEMBL4101708 0.83
SCHEMBL2938572 0.83
SCHEMBL2938568 0.83
SCHEMBL15492256 0.83
SCHEMBL15036607 0.83
SCHEMBL658175 0.83
SCHEMBL14607692 0.83

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-1234743-C Cross-linked low medium electrical property high polymer material and film, base plate and electronic part using the same TDK CORP (JP) 2006-01-04 CN disclosed
EP-1227115-B1 Crosslinkable polymer material of low relative permittivity, and films, substrates and electronic units formed of it TDK CORP (JP) 2005-11-16 EP disclosed
US-6713581-B2 OBTAINED THROUGH COPOLYMERIZATION OF A MONOMER COMPOSITION THAT CONTAINS, AS MONOMERS, A FUMARIC DIESTER AND AN EPOXY GROUP- HAVING (METH)ACRYLATE; BONDS OR ADHERES WELL TO METAL CONDUCTOR LAYERS TDK CORPORATION (JP) 2004-03-30 US disclosed
US-20020137867-A1 Crosslinkable polymer material of low relative permittivity, and films, substrates and electronic units formed of it DAI-ICHI KOGYO SEIYAKU CO., LTD. (JP) 2002-09-26 US disclosed
CN-1367185-A Cross-linked low medium electrical property high polymer material and film, base plate and electronic part using the same TDK CORP (JP) 2002-09-04 CN disclosed
EP-1227115-A2 Crosslinkable polymer material of low relative permittivity, and films, substrates and electronic units formed of it TDK Corporation (JP) 2002-07-31 EP disclosed