SCHEMBL6139930

SCHEMBL6139930

CN(C)c1ccc(S(OS(=O)(=O)c2ccc(C(C)(C)C)cc2)(c2ccc(OC(C)(C)C)cc2)c2ccc(N(C)C)cc2)cc1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.39
MEN1 O00255 2/20 0.39
KMT2A Q03164 2/20 0.39
MAPT P10636 1/20 0.39
RECQL P46063 1/20 0.39
CA1 P00915 1/20 0.37
CA2 P00918 1/20 0.37
CA9 Q16790 1/20 0.37
ENPP1 P22413 5/20 0.37
ENPP3 O14638 4/20 0.37
HSD11B1 P28845 2/20 0.36
HSD17B3 P37058 1/20 0.36
ENPP2 Q13822 1/20 0.36
TP53 P04637 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
HSD17B10 Q99714 2/20 0.36
TSHR P16473 1/20 0.36
SLC2A1 P11166 1/20 0.35
KDM4E B2RXH2 2/20 0.34
HPGD P15428 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6140595 1.00 ALDH1A1 (0.39) ALDH1A1MEN1KMT2AMAPTRECQL
SCHEMBL6140387 0.91 ALDH1A1 (0.43) ALDH1A1MEN1KMT2AMAPTRECQL
SCHEMBL6140726 0.88 CA1 (0.37) ALDH1A1MEN1KMT2AMAPTRECQL
SCHEMBL6140117 0.88 ALDH1A1 (0.43) ALDH1A1MEN1KMT2AMAPTTP53
SCHEMBL6140687 0.88 ALDH1A1 (0.43) ALDH1A1MEN1KMT2AMAPTTP53
SCHEMBL6140647 0.88 ALDH1A1 (0.38) ALDH1A1MEN1KMT2AMAPTCA1
SCHEMBL6140765 0.85 CNR2 (0.37) ALDH1A1MEN1KMT2AMAPTRECQL
SCHEMBL6140133 0.85 CNR2 (0.37) ALDH1A1MEN1KMT2AMAPTRECQL
SCHEMBL8324855 0.82 ALDH1A1 (0.38) ALDH1A1MEN1KMT2AMAPTCA1
SCHEMBL8318837 0.82 ALDH1A1 (0.38) ALDH1A1MEN1KMT2AMAPTCA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6955939-B1 Memory element formation with photosensitive polymer dielectric ADVANCED MICRO DEVICES, INC. (US) 2005-10-18 US disclosed
US-6878961-B2 Photosensitive polymeric memory elements ADVANCED MICRO DEVICES, INC. (US) 2005-04-12 US disclosed
US-20050045877-A1 PHOTOSENSITIVE POLYMERIC MEMORY ELEMENTS MORGAN STANLEY SENIOR FUNDING, INC. 2005-03-03 US disclosed
US-6825060-B1 Photosensitive polymeric memory elements ADVANCED MICRO DEVICES, INC. 2004-11-30 US disclosed
US-6534243-B1 A coating containing a cleaving compound to trim resist features; permitting a deprotection region to form within an inner portion of the patterned resist; removing coating and deprotection region to provide a second patterned feature ADVANCED MICRO DEVICES, INC. 2003-03-18 US disclosed
US-6492075-B1 COATING WITH CLEAVING COMPOUND TO CONTROLLABLY DECREASE SIZE OF DEVELOPED RESIST ADVANCED MICRO DEVICES, INC. 2002-12-10 US disclosed
US-6274289-B1 Chemical resist thickness reduction process ADVANCED MICRO DEVICES, INC. 2001-08-14 US disclosed
US-5847218-A Sulfonium salts and chemically amplified positive resist compositions SHIN-ETSU CHEMICAL CO., LTD. (JP) 1998-12-08 US disclosed