⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6151277 | 0.63 | — | — | |
| SCHEMBL1402763 | 0.52 | TSHR (0.37) | — | |
| SCHEMBL6279239 | 0.52 | — | — | |
| SCHEMBL1276577 | 0.50 | CRBN (0.33) | — | |
| SCHEMBL1275536 | 0.46 | — | — | |
| SCHEMBL14863658 | 0.46 | — | — | |
| SCHEMBL1276561 | 0.45 | — | — | |
| SCHEMBL27558463 | 0.45 | — | — | |
| SCHEMBL27560829 | 0.45 | — | — | |
| SCHEMBL12062681 | 0.37 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1120667-B1 | Process for production of optical material | MITSUBISHI GAS CHEMICAL CO (JP) | 2005-06-22 | — | — | EP | disclosed |
| EP-1099721-B1 | Composition for producing resin | MITSUBISHI GAS CHEMICAL CO (JP) | 2005-01-12 | — | — | EP | disclosed |
| EP-1426392-A1 | COMPOSITION FOR OPTICAL MATERIAL | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2004-06-09 | — | — | EP | disclosed |
| EP-1378535-A1 | POLYMERIZATION REGULATORS AND COMPOSITIONS FOR RESIN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2004-01-07 | — | — | EP | disclosed |
| EP-1326095-A1 | COMPOSITION FOR OPTICAL MATERIAL | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2003-07-09 | — | — | EP | disclosed |
| EP-1270566-A1 | EPISULFIDE COMPOUND AND PROCESS FOR PRODUCING THE SAME | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2003-01-02 | — | — | EP | disclosed |
| US-6472495-B1 | RESIN PRODUCED BY CURING THE COMPOSITION BY POLYMERIZATION HAS AN EXCELLENT IMPACT RESISTANCE AND OPTICAL PROPERTIES, AND IS SUITABLE AS AN OPTICAL MATERIAL. POLYMERS WITH SULFIDE, SELINIUM AND TELLURIUM | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2002-10-29 | — | — | US | disclosed |
| US-6444146-B2 | DISCOLORATION INHIBITION | MITSUBISHI GAS CHEMICAL CO. (JP) | 2002-09-03 | — | — | US | disclosed |
| EP-1120667-A2 | Process for production of optical material | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2001-08-01 | — | — | EP | disclosed |
| US-20010008278-A1 | Process for production of optical material | MITSUBISHI GAS CHEMICAL COMPANY, INC (JP) | 2001-07-19 | — | — | US | disclosed |
| EP-1099721-A1 | Composition for producing resin | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2001-05-16 | — | — | EP | disclosed |