SCHEMBL1402763

SCHEMBL1402763

c1cc(COCC2CS2)ccc1COCC1CS1

nearest known ligand 0.39

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.37
NAAA Q02083 1/20 0.36
TAAR1 Q96RJ0 1/20 0.34
LMNA P02545 1/20 0.34
BCHE P06276 1/20 0.33
ACHE P22303 1/20 0.33
MMP2 P08253 3/20 0.33
MMP9 P14780 3/20 0.33
MMP14 P50281 3/20 0.33
MMP8 P22894 2/20 0.33
MMP3 P08254 1/20 0.33
MMP7 P09237 1/20 0.33
CTSL P07711 1/20 0.33
CTSB P07858 1/20 0.33
CTSK P43235 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2734450 0.90 TSHR (0.54) TSHRNAAATAAR1LMNABCHE
SCHEMBL4647642 0.89 LMNA (0.33) TSHRNAAALMNA
SCHEMBL15794308 0.87 IDO1 (0.47)
SCHEMBL4646518 0.86 MMP2 (0.41) LMNAMMP2MMP9MMP14MMP8
SCHEMBL4649028 0.86 HPGD (0.38) TSHRNAAA
SCHEMBL1402494 0.84 TSHR (0.37) TSHRTAAR1LMNABCHEACHE
SCHEMBL1402838 0.78 CHRNB2 (0.35) TSHRMMP2MMP9MMP14MMP8
SCHEMBL8642957 0.72 TSHR (0.42) TSHRNAAATAAR1LMNABCHE
SCHEMBL6151219 0.70
SCHEMBL5262180 0.70 TSHR (0.45) TSHRTAAR1LMNABCHEACHE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 70 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2963457-B1 OPTICAL MATERIAL, COMPOSITION FOR USE THEREIN, AND USE THEREOF MITSUI CHEMICALS INC (JP) 2018-07-11 EP claimed
US-20220056170-A1 OPTICAL MATERIAL COMPOSITION AND OPTICAL MATERIAL TOKUYAMA CORPORATION (JP) 2022-02-24 US disclosed
US-20210372984-A1 METHOD FOR SETTING POLYMERIZATION CONDITION AND METHOD FOR MANUFACTURING OPTICAL MATERIAL MITSUI CHEMICALS, INC. (JP) 2021-12-02 US disclosed
EP-3901184-A1 OPTICAL MATERIAL COMPOSITION AND OPTICAL MATERIAL Tokuyama Corporation (JP) 2021-10-27 EP disclosed
EP-2123695-B1 METAL THIETANE COMPOUND, POLYMERIZABLE COMPOSITION COMPRISING THE COMPOUND, RESIN, AND USE OF THE RESIN MITSUI CHEMICALS INC (JP) 2021-06-23 EP disclosed
EP-3828224-A1 METHOD FOR SETTING POLYMERIZATION CONDITIONS AND METHOD FOR PRODUCING OPTICAL MATERIAL Mitsui Chemicals, Inc. (JP) 2021-06-02 EP disclosed
US-20210079151-A1 METHOD FOR SETTING POLYMERIZATION CONDITION AND METHOD FOR MANUFACTURING OPTICAL MATERIAL MITSUI CHEMICALS, INC. (JP) 2021-03-18 US disclosed
EP-3778655-A1 METHOD FOR SETTING POLYMERIZATION CONDITIONS AND METHOD FOR PRODUCING OPTICAL MATERIAL Mitsui Chemicals, Inc. (JP) 2021-02-17 EP disclosed
US-20210041599-A1 PLASTIC POLARIZING LENS AND METHOD FOR MANUFACTURING SAME HOPNIC LABORATORY CO., LTD. (JP) 2021-02-11 US disclosed
US-10899094-B2 Method of manufacturing plastic lens, method of positioning film, and composite body HOPNIC LABORATORY CO., LTD. (JP) 2021-01-26 US disclosed
EP-1482002-B1 POLYMERIZABLE COMPOSITION CONTAINING NOVEL CYCLIC SULFUR COMPOUND AND RESIN OBTAINED BY CURING THE POLYMERIZABLE COMPOSITION MITSUI CHEMICALS INC (JP) 2010-04-28 EP disclosed
US-20100063246-A1 POLYMERIZABLE COMPOSITION, RESIN USING THE SAME, OPTICAL COMPONENT AND LENS MITSUI CHEMICALS, INC. (JP) 2010-03-11 US disclosed
EP-2123695-A1 METAL THIETANE COMPOUND, POLYMERIZABLE COMPOSITION COMPRISING THE COMPOUND, RESIN, AND USE OF THE RESIN Mitsui Chemicals, Inc. (JP) 2009-11-25 EP disclosed
EP-2036951-A1 POLYMERIZABLE COMPOSITION, RESIN USING THE SAME, OPTICAL COMPONENT AND LENS Mitsui Chemicals, Inc. (JP) 2009-03-18 EP disclosed
EP-2014700-A1 POLYMERIZABLE COMPOSITION, RESIN USING THE SAME AND OPTICAL COMPONENT Mitsui Chemicals, Inc. (JP) 2009-01-14 EP disclosed
US-20080206668-A1 NEGATIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-08-28 US disclosed
EP-1962139-A1 Negative resist composition and pattern forming method using the same FUJIFILM Corporation (JP) 2008-08-27 EP disclosed
US-7132501-B2 Polymerizable composition containing novel cyclic sulfur compound and resin obtained by curing the polymerizable composition MITSUI CHEMICALS, INC. (JP) 2006-11-07 US disclosed
US-20050215757-A1 Polymerizable composition containing novel cyclic sulfur compound and resin obtained by curing the polymerizable composition MITSUI CHEMICALS, INC. (JP) 2005-09-29 US disclosed
EP-1482002-A1 POLYMERIZABLE COMPOSITION CONTAINING NOVEL CYCLIC SULFUR COMPOUND AND RESIN OBTAINED BY CURING THE POLYMERIZABLE COMPOSITION MITSUI CHEMICALS, INC. (JP) 2004-12-01 EP disclosed