SCHEMBL615259

SCHEMBL615259

C=CC1C=CC=CC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20799732 1.00
SCHEMBL5071786 0.83
SCHEMBL11719375 0.80 ALDH1A1 (0.35)
SCHEMBL11719370 0.80 ALDH1A1 (0.35)
SCHEMBL14394010 0.74
SCHEMBL8173486 0.74
SCHEMBL17413405 0.74
SCHEMBL18306593 0.74
SCHEMBL1403976 0.74
SCHEMBL4306031 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 80 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118215676-A Specific conjugation of antibody drug conjugates 杭州多禧生物科技有限公司 2024-06-18 CN claimed
US-20120067843-A1 Method of forming fine pattern KABUSHIKI KAISHA TOSHIBA (JP) 2012-03-22 US claimed
EP-0323008-B1 LIQUID CRYSTAL CELL DIRECTOR-GENERAL OF THE AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 1993-10-06 EP claimed
JP-10242021-A None JP disclosed
CN-118215676-A Specific conjugation of antibody drug conjugates 杭州多禧生物科技有限公司 2024-06-18 CN disclosed
CN-115786018-B Lubricating grease for harmonic reducer and preparation method thereof 洛阳精一新材料科技有限公司 2024-01-26 CN disclosed
US-20230420538-A1 DEVICE WITH MODIFIED WORK FUNCTION LAYER AND METHOD OF FORMING THE SAME TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2023-12-28 US disclosed
CN-112280611-B Traction oil for zero-clearance stepless speed changer 江苏创斯达科技有限公司 2023-03-14 CN disclosed
CN-115786018-A Lubricating grease for harmonic reducer and preparation method thereof 洛阳精一新材料科技有限公司 2023-03-14 CN disclosed
CN-115786018-A Lubricating grease for harmonic reducer and preparation method thereof 洛阳精一新材料科技有限公司 2023-03-14 CN disclosed
CN-113195696-A Substrate cleaning liquid and method for manufacturing device 默克专利有限公司 2021-07-30 CN disclosed
JP-H10242021-A METHOD OF FORMING RESIST PATTERN NEC CORP 1998-09-11 JP disclosed
WO-1998025873-A1 METHOD FOR PRODUCING ALKYLBENZENES AVENTIS RESEARCH & TECHNOLOGIES GMBH & CO. KG (DE) 1998-06-18 WO disclosed
EP-0451850-B1 Positive photoresist composition MITSUBISHI CHEM CORP (JP) 1996-07-24 EP disclosed
US-5225311-A Phenolic resins with o-cresol and 2,5-dimethylphenol and 3,5 dimethylphenol MITSUBISHI PETROCHEMICAL CO., LTD. (JP) 1993-07-06 US disclosed
EP-0451850-A1 Positive photoresist composition MITSUBISHI CHEMICAL CORPORATION (JP) 1991-10-16 EP disclosed
EP-0199209-B1 PROCESS FOR THE PREPARATION OF ALKYL BENZENES BASF Aktiengesellschaft (DE) 1988-10-26 EP disclosed
US-4665252-A AROMATIZATOIN OF CYCLOHEXENES WITH ACID ZEOLITE BASF AKTIENGESELLSCHAFT (DE) 1987-05-12 US disclosed
EP-0070730-A1 Selective gas-permeable films MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 1983-01-26 EP disclosed
US-3856868-A SYNTHESIS OF 5-VINYLCYCLOHEXA-1,3-DIENE PHILLIPS PETROLEUM CO 1974-12-24 US disclosed